DJ

Dong-won Jung

Samsung: 15 patents #9,125 of 75,807Top 15%
AT Auros Technology: 7 patents #2 of 32Top 7%
Overall (All Time): #177,491 of 4,157,543Top 5%
23
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
12341047 Overlay measurement device and method, and system and program therefor Sol-Lee Hwang, Hee-Chul Lim, Min Ho Lee, Hyun-Kyoo Shon 2025-06-24
12334382 Overlay measurement device and method, and system and program therefor Sol-Lee Hwang, Hee-Chul Lim, Min Ho Lee, Hyun-Kyoo Shon 2025-06-17
12235590 Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor Sol-Lee Hwang, Hee-Chul Lim, Hyun-Kyoo Shon, Min Ho Lee 2025-02-25
12169364 Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor Sol-Lee Hwang, Hee-Chul Lim, Hyun-Kyoo Shon, Min Ho Lee 2024-12-17
12169365 Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor Sol-Lee Hwang, Hee-Chul Lim, Hyun-Kyoo Shon, Min Ho Lee 2024-12-17
12009243 Overlay measurement device and method, and system and program therefor Sol-Lee Hwang, Hee-Chul Lim, Min Ho Lee, Hyun-Kyoo Shon 2024-06-11
11960214 Computer-readable storage medium recording data structure for storing data controlling operation of overlay measurement device and overlay measurement device therefor Sol-Lee Hwang, Hee-Chul Lim, Hyun-Kyoo Shon, Min Ho Lee 2024-04-16
10252310 Tube flanging method 2019-04-09
7241552 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2007-07-10
7084227 Photosensitive polymer and chemically amplified photoresist composition containing the same Sang-jun Choi, Si-hyeung Lee, Sook Lee 2006-08-01
7045267 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2006-05-16
6893793 Photosensitive polymer and chemically amplified photoresist composition containing the same Sang-jun Choi, Si-hyeung Lee, Sook Lee 2005-05-17
6642336 Photosensitive polymer Sook Lee, Ki Young Kwon, Si-hyeung Lee, Kwang-Sub Yoon, Hyun-Woo Kim +2 more 2003-11-04
6596459 Photosensitive polymer and resist composition containing the same Hyun-Woo Kim, Ki Young Kwon, Si-hyeung Lee, Sook Lee, Kwang-Sub Yoon +2 more 2003-07-22
6593441 Photosensitive polymer and chemically amplified photoresist composition containing the same Sang-jun Choi, Si-hyeung Lee, Sook Lee 2003-07-15
6537727 Resist composition comprising photosensitive polymer having loctone in its backbone Kwang-Sub Yoon, Si-hyeung Lee, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2003-03-25
6503687 Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition Hyun-Woo Kim, Si-hyueng Lee, Ki Young Kwon, Sang-jun Choi, Sang-Gyun Woo 2003-01-07
6472120 Photosensitive polymer and chemically amplified photoresist composition containing the same Sang-jun Choi, Si-hyeung Lee, Sook Lee 2002-10-29
6300036 Photosensitive polymers and chemically amplified photoresist compositions using the same Sang-jun Choi, Yool Kang, Chun-geun Park 2001-10-09
6287747 Photosensitive polymer having cyclic backbone and resist composition comprising the same Sang-jun Choi, Si-hyeung Lee 2001-09-11
6280903 Chemically amplified resist composition Yool Kang, Sang-jun Choi, Chun-geun Park, Young-bum Koh 2001-08-28
6277538 Photosensitive polymer having cyclic backbone and resist composition comprising the same Sang-jun Choi 2001-08-21
6114084 Chemically amplified resist composition Yool Kang, Sang-jun Choi, Chun-geun Park, Young-bum Koh 2000-09-05