Issued Patents All Time
Showing 1–1 of 1 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6503687 | Alicyclic photosensitive polymer, resist composition containing the same and method of preparing the resist composition | Hyun-Woo Kim, Ki Young Kwon, Dong-won Jung, Sang-jun Choi, Sang-Gyun Woo | 2003-01-07 |