SL

Si-hyeung Lee

Samsung: 20 patents #6,655 of 75,807Top 9%
Overall (All Time): #223,367 of 4,157,543Top 6%
20
Patents All Time

Issued Patents All Time

Showing 1–20 of 20 patents

Patent #TitleCo-InventorsDate
9673195 Semiconductor device having sufficient process margin and method of forming same Man-Hyoung Ryoo, Gi-Sung Yeo, Gyu-Chul Kim, Sung-Gon Jung, Chang-Min Park +1 more 2017-06-06
8193047 Semiconductor device having sufficient process margin and method of forming same Man-Hyoung Ryoo, Gi-Sung Yeo, Gyu-Chul Kim, Sung-Gon Jung, Chang-Min Park +1 more 2012-06-05
8169012 Semiconductor device and method of fabricating the semiconductor device Yong-Kug Bae, Tae-hyuk Ahn, Seok-Hwan Oh 2012-05-01
8080886 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same Chang-Jin Kang, Myeong-Cheol Kim, Man-Hyoung Ryoo, Doo-Youl Lee 2011-12-20
7457058 Optical element holder and projection exposure apparatus having the same Woo-Seok Shim, Jung-hyeon Lee, Young-Koog Han, Kwang-Sub Yoon 2008-11-25
7381508 Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same Chang-Jin Kang, Myeong-Cheol Kim, Man-Hyoung Ryoo, Doo-Youl Lee 2008-06-03
7259065 Method of forming trench in semiconductor device Doo-Hoon Goo, Han-ku Cho, Sang-Gyun Woo, Gi-Sung Yeo 2007-08-21
7241552 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2007-07-10
7221031 Semiconductor device having sufficient process margin and method of forming same Man-Hyoung Ryoo, Gi-Sung Yeo, Gyu-Chul Kim, Sung-Gon Jung, Chang-Min Park +1 more 2007-05-22
7084227 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Sang-jun Choi, Sook Lee 2006-08-01
7045267 Resist composition comprising photosensitive polymer having lactone in its backbone Kwang-Sub Yoon, Dong-won Jung, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2006-05-16
6893793 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Sang-jun Choi, Sook Lee 2005-05-17
6642336 Photosensitive polymer Sook Lee, Ki Young Kwon, Kwang-Sub Yoon, Hyun-Woo Kim, Dong-won Jung +2 more 2003-11-04
6613492 Photosensitive polymer having phenyl ring and lactone group and resist composition comprising the same 2003-09-02
6596459 Photosensitive polymer and resist composition containing the same Hyun-Woo Kim, Ki Young Kwon, Dong-won Jung, Sook Lee, Kwang-Sub Yoon +2 more 2003-07-22
6593441 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Sang-jun Choi, Sook Lee 2003-07-15
6537727 Resist composition comprising photosensitive polymer having loctone in its backbone Kwang-Sub Yoon, Dong-won Jung, Hyun-Woo Kim, Sook Lee, Sang-Gyun Woo +1 more 2003-03-25
6472120 Photosensitive polymer and chemically amplified photoresist composition containing the same Dong-won Jung, Sang-jun Choi, Sook Lee 2002-10-29
6287747 Photosensitive polymer having cyclic backbone and resist composition comprising the same Sang-jun Choi, Dong-won Jung 2001-09-11
6284438 Method for manufacturing a photoresist pattern defining a small opening and method for manufacturing semiconductor device using the same Sang-jun Choi, Yool Kang, Joo-tae Moon 2001-09-04