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Semiconductor device having sufficient process margin and method of forming same |
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Oligomer probe array and method of producing the same |
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Memory units and related semiconductor devices including nanowires |
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Semiconductor device having sufficient process margin and method of forming same |
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Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
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Photolabile compound, oligomer probe array and substrate for oligomer probe array containing the same, and manufacturing method of the same |
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Biosensor using nanoscale material as transistor channel and method of fabricating the same |
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Polymer, top coating layer, top coating composition and immersion lithography process using the same |
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2010-01-05 |
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Photolabile compound and substrate for oligomer probe array with the same |
Sung-min Chi, Jung-hwan Hah, Kyoung-seon Kim, Won-sun Kim, Sang-jun Choi |
2009-07-28 |
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Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions |
Mitsuhiro Hata, Sang-jun Choi |
2008-12-23 |
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Top coating composition for photoresist and method of forming photoresist pattern using same |
Mitsuhiro Hata, Sang-Gyun Woo, Hyun-Woo Kim, Jin Young Yoon, Jung-hwan Hah |
2008-06-10 |
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Integrated circuit semiconductor device with overlay key and alignment key and method of fabricating the same |
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2008-06-03 |
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Semiconductor device having sufficient process margin and method of forming same |
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2007-05-22 |
