MH

Mitsuhiro Hata

Samsung: 9 patents #14,526 of 75,807Top 20%
SC Sumitomo Chemical: 8 patents #606 of 4,033Top 20%
Overall (All Time): #276,997 of 4,157,543Top 7%
17
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9063414 Photoresist composition Koji Ichikawa, Takahiro Yasue 2015-06-23
8900790 Photoresist composition Tatsuro Masuyama 2014-12-02
8546059 Photoresist composition Koji Ichikawa, Takayuki Miyagawa 2013-10-01
8475999 Compound and photoresist composition containing the same Tatsuro Masuyama 2013-07-02
8476473 Compound, method for preparing the compound and resist composition containing the compound Ichiki Takemoto, Nobuo Ando 2013-07-02
8062829 Chemically amplified resist composition and chemically amplified resist composition for immersion lithography Yusuke Fuji, Takayuki Miyagawa 2011-11-22
8048612 Polymer and chemically amplified resist composition comprising the same Yusuke Fuji 2011-11-01
7985529 Mask patterns including gel layers for semiconductor device fabrication Hyun-Woo Kim, Jung-hwan Hah, Sang-Gyun Woo 2011-07-26
7981985 Polymer and chemically amplified resist composition comprising the same Yusuke Fuji 2011-07-19
7855038 Mask patterns for semiconductor device fabrication and related methods and structures Jung-hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo 2010-12-21
7642042 Polymer, top coating layer, top coating composition and immersion lithography process using the same Sang-jun Choi, Sang-Gyun Woo, Man-Hyoung Ryoo 2010-01-05
7604911 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating, composition for fine pattern formation, and method of fabricating semiconductor device Jung-hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo 2009-10-20
7468235 Barrier coating compositions containing fluorine and methods of forming photoresist patterns using such compositions Sang-jun Choi, Man-Hyoung Ryoo 2008-12-23
7384730 Top coating composition for photoresist and method of forming photoresist pattern using same Man-Hyoung Ryoo, Sang-Gyun Woo, Hyun-Woo Kim, Jin Young Yoon, Jung-hwan Hah 2008-06-10
7361609 Mask patterns for semiconductor device fabrication and related methods Jung-hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo 2008-04-22
7361612 Barrier coating compositions containing silicon and methods of forming photoresist patterns using the same Sang-jun Choi, Han-ku Cho 2008-04-22
7314691 Mask pattern for semiconductor device fabrication, method of forming the same, method for preparing coating composition for fine pattern formation, and method of fabricating semiconductor device Jung-hwan Hah, Hyun-Woo Kim, Sang-Gyun Woo 2008-01-01