IT

Ichiki Takemoto

SC Sumitomo Chemical: 37 patents #36 of 4,033Top 1%
Overall (All Time): #90,761 of 4,157,543Top 3%
37
Patents All Time

Issued Patents All Time

Showing 1–25 of 37 patents

Patent #TitleCo-InventorsDate
8476473 Compound, method for preparing the compound and resist composition containing the compound Nobuo Ando, Mitsuhiro Hata 2013-07-02
8378016 Chemically amplified positive resist composition Nobuo Ando, Isao Yoshida, Yukako Harada 2013-02-19
8329377 Imide compound and chemically amplified resist composition containing the same Tatsuro Masuyama, Takashi Hiraoka 2012-12-11
8173350 Oxime compound and resist composition containing the same Tatsuro Masuyama, Kazuhiko Hashimoto, Takashi Hiraoka 2012-05-08
8158329 Compound and chemically amplified resist composition containing the same Nobuo Ando 2012-04-17
8110336 Resin and chemically amplified resist composition comprising the same Nobuo Ando 2012-02-07
8071270 Polyhydric compound and chemically amplified resist composition containing the same Nobuo Ando 2011-12-06
8062830 Chemically amplified positive resist composition Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando 2011-11-22
8057983 Chemically amplified positive resist composition Yusuke Fuji, Junji Shigematsu, Takayuki Miyagawa, Nobuo Ando 2011-11-15
7932334 Resin suitable for an acid generator Nobuo Ando, Isao Yoshida, Yukako Harada 2011-04-26
7794914 Chemically amplified positive resist composition Nobuo Ando, Yusuke Fuji 2010-09-14
7625689 Chemically amplified positive resist composition Satoshi Yamaguchi, Hiromu Sakamoto 2009-12-01
7611822 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same 2009-11-03
7579497 Salt suitable for an acid generator and a chemically amplified resist composition containing the same Yukako Harada, Kouji Toishi 2009-08-25
7556908 Chemically amplified positive resist composition, (meth)acrylate derivative and a process for producing the same Isao Yoshida, Takayuki Miyagawa 2009-07-07
7494763 Polyhydric phenol compound and chemically amplified resist composition containing the same Nobuo Ando, Junji Shigematsu 2009-02-24
7304175 Salt suitable for an acid generator and a chemically amplified resist composition containing the same Yukako Harada, Kouji Toishi 2007-12-04
7232642 Chemically amplified positive resist composition, a haloester derivative and a process for producing the same Kazuhiko Hashimoto, Takayuki Miyagawa 2007-06-19
7205090 Chemical amplification type positive resist composition Kazuhiko Hashimoto, Satoshi Yamaguchi 2007-04-17
6245478 Resist composition Yasunori Uetani 2001-06-12
5256822 Imine derivatives and process for production thereof Takeo Fujii, Hideyuki Goto, Ritsu Okajima 1993-10-26
4835286 2-Substituted phenyl-4,5,6,7-tetrahydro-2H-indazoles Eiki Nagano, Masayuki Fukushima, Ryo Yoshida, Hiroshi Matsumoto 1989-05-30
4803270 Process of producing fluoroaniline derivatives 1989-02-07
4762948 Process for preparing optically active arylacetic acid derivative Yoshihiko Ito, Tamio Hayashi, Norio Kawamura 1988-08-09
4690709 Urea derivatives, and their use as herbicides Seizo Sumida, Ryo Yoshida, Katsuzo Kamoshita 1987-09-01