Issued Patents All Time
Showing 1–25 of 28 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8689150 | Method of fabricating semiconductor device | Jee-Eun Jung, Kyoung-Yun Baek | 2014-04-01 |
| 8536347 | Photoacid generator, chemically amplified resist composition including the same, and associated methods | Yool Kang, Hak-won Kim, Weoun-ju Kim, Hyun-Woo Kim, Hai-sub Na +1 more | 2013-09-17 |
| 8510684 | Method of forming a photomask layout using optical proximity correction to compensate for a three-dimensional mask effect | Moon-Gyu Jeong, Jung Hoon SER | 2013-08-13 |
| 8484584 | Systems, methods and computer program products for forming photomasks with reduced likelihood of feature collapse, and photomasks so formed | Mi Kyeong Lee | 2013-07-09 |
| 8399174 | Method of forming fine patterns using a block copolymer | Kyoung Taek Kim, Hyun-Woo Kim, Sang Ouk Kim, Shi-Yong Yi | 2013-03-19 |
| 8392854 | Method of manufacturing semiconductor device by using uniform optical proximity correction | Sang-wook Kim, Chun-Suk Suh, Jung Hoon SER, Moon-Gyu Jeong, Seong Bo Shim | 2013-03-05 |
| 8338310 | Method of forming line/space patterns | Sung-Gon Jung, Suk-Joo Lee, Woo-Sung Han | 2012-12-25 |
| 8341561 | Methods of arranging mask patterns and associated apparatus | Dong Woon PARK, Woo-Sung Han, Jeong-Ho Yeo | 2012-12-25 |
| 8263487 | Method of forming patterns of semiconductor device | Dong Ki Yoon, Shi-Yong Yi, Seok-Hwan Oh, Kwang-Sub Yoon, Myeong-Cheol Kim +1 more | 2012-09-11 |
| 8227349 | Method of forming a mask pattern, method of forming a minute pattern, and method of manufacturing a semiconductor device using the same | Hyoung-hee Kim, Yool Kang, Seong Ho Moon, Seok-Hwan Oh, So-Ra Han | 2012-07-24 |
| 8173358 | Method of forming fine patterns of a semiconductor device | Hyoung-hee Kim, Yool Kang, Jin Young Yoon | 2012-05-08 |
| 8039196 | Method of forming fine patterns using a block copolymer | Kyoung Taek Kim, Hyun-Woo Kim, Sang Ouk Kim, Shi-Yong Yi | 2011-10-18 |
| 7939223 | Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method | Hak-Seung Han, Byung-Gook Kim, Hee-Bom Kim, Sung Ho Park | 2011-05-10 |
| 7736838 | Methods for forming pattern using electron beam and cell masks used in electron beam lithography | Hee-Bom Kim | 2010-06-15 |
| 7601467 | Method of manufacturing EUVL alternating phase-shift mask | Sung-min Huh, Hee-Bom Kim, Dong-Wan Kim, Chan-uk Jeon | 2009-10-13 |
| 7560198 | Photo-mask having exposure blocking region and methods of designing and fabricating the same | Il-Yong Jang, Seong-yong Moon, Jeong Yun Lee, Sung-Hoon Jang | 2009-07-14 |
| 7527901 | Method of repairing phase shift mask | Jeong Yun Lee, Il-Yong Jang, Won-Suk Ahn, Sung-Jae Han | 2009-05-05 |
| 7521156 | Photo mask and method of correcting the transmissivity of a photo mask | Won-Suk Ahn, Moon Gyu Sung, Sung-Yong Cho, Jeong Yun Lee | 2009-04-21 |
| 7465524 | Photomask and method of controlling transmittance and phase of light using the photomask | Jin Hong Park | 2008-12-16 |
| 7393615 | Mask for use in measuring flare, method of manufacturing the mask, method of identifying flare-affected region on wafer, and method of designing new mask to correct for flare | Won-tai Ki, Tae-Moon Jeong, Shun-Yong Zinn, Woo-Sung Han, Jung Min Sohn | 2008-07-01 |
| 7389491 | Methods, systems and computer program products for correcting photomask using aerial images and boundary regions | Ji-Soong Park, Sung-min Huh, In-Kyun Shin | 2008-06-17 |
| 7369254 | System and method for measuring dimension of patterns formed on photomask | Dong Gun Lee, Sang-Yong Yu, Seong-yong Moon, Byung-Gook Kim | 2008-05-06 |
| 7341809 | Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation | Tae-Moon Jeong, Seong-hyuck Kim | 2008-03-11 |
| 7070891 | Photomask, method for manufacturing the same, and method for measuring optical characteristics of wafer exposure system using the photomask during operation | Tae-Moon Jeong, Seong-hyuck Kim | 2006-07-04 |
| 7065735 | Method for making an OPC mask and an OPC mask manufactured using the same | Won-tai Ki | 2006-06-20 |