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Systems and methods using mask pattern measurements performed with compensated light signals |
Ji Hoon Na, Dong Gun Lee |
2022-03-22 |
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Apparatus for manufacturing pellicle |
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2021-07-20 |
| 11061322 |
Systems and methods using mask pattern measurements performed with compensated light signals |
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2021-07-13 |
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2020-08-18 |
| 10437143 |
Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle |
Hwan Chul Jeon, Mun Ja Kim, Sung Won Kwon, Chang-Young Jeong |
2019-10-08 |
| 8673522 |
Method for manufacturing photomask and photomask manufactured using the same |
Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee |
2014-03-18 |
| 8522172 |
Method of forming photomask using calibration pattern, and photomask having calibration pattern |
Young Keun Yoon, Myoung-Soo Lee, Chan-uk Jeon, Hak-Seung Han |
2013-08-27 |
| 8475980 |
Methods of forming semiconductor devices using photolithographic shot grouping |
Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee |
2013-07-02 |
| 8329381 |
Pattern forming method |
Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee |
2012-12-11 |
| 8213722 |
Method for inspecting critical dimension uniformity at high speed measurement |
Myoung-Soo Lee, Young-Su Sung |
2012-07-03 |
| 8137870 |
Method of manufacturing photomask |
Myoung-Soo Lee, Young-Su Sung, Min Lee, Dong Gun Lee |
2012-03-20 |
| 7939223 |
Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method |
Hak-Seung Han, Seong-woon Choi, Byung-Gook Kim, Sung Ho Park |
2011-05-10 |
| 7897299 |
Phase-shift mask and method of forming the same |
Gi-Sung Yoon, Sun Young Choi |
2011-03-01 |
| 7865866 |
Method of inspecting mask using aerial image inspection apparatus |
Min Kyu JI, Sun Young Choi, Hyun-Joo Baik |
2011-01-04 |
| 7754398 |
Photo mask having assist pattern and method of fabricating the same |
Jeung-woo Lee, Sung-min Huh |
2010-07-13 |
| 7745068 |
Binary photomask having a compensation layer |
Jin-sik Jung, Woo-Sung Han, Sung-min Huh |
2010-06-29 |
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Jin-sik Jung, Hoon Kim, Sung-min Huh |
2010-06-29 |
| 7736838 |
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Seong-woon Choi |
2010-06-15 |
| 7642017 |
Reflective photomask, method of fabricating the same, and reflective blank photomask |
Sung-min Huh |
2010-01-05 |
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Method of manufacturing EUVL alternating phase-shift mask |
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2009-10-13 |
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Method of measuring a critical dimension of a semiconductor device and a related apparatus |
Yo Han Choi |
2009-04-28 |
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Method for forming a phase-shifting mask for semiconductor device manufacture |
Ji Suk Hong, Sang Sool Koo |
2004-07-27 |
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Simulation method in lithographic process |
Chang Nam Ahn |
2000-04-11 |
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Phase shift mask for forming contact holes |
Il Ho Lee |
1998-06-30 |
