Issued Patents All Time
Showing 1–24 of 24 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11281093 | Systems and methods using mask pattern measurements performed with compensated light signals | Ji Hoon Na, Dong Gun Lee | 2022-03-22 |
| 11067887 | Apparatus for manufacturing pellicle | Mun Ja Kim, Ji-Beom Yoo, Soo-Young Kim, Hwan Chul Jeon, Seul Gi Kim +2 more | 2021-07-20 |
| 11061322 | Systems and methods using mask pattern measurements performed with compensated light signals | Ji Hoon Na, Dong Gun Lee | 2021-07-13 |
| 10747104 | Method of manufacturing pellicle and apparatus for assembling pellicle | Mun Ja Kim, Ji-Beom Yoo, Soo-Young Kim, Hwan Chul Jeon, Seul Gi Kim +2 more | 2020-08-18 |
| 10437143 | Pellicle for exposure to extreme ultraviolet light, photomask assembly, and method of manufacturing the pellicle | Hwan Chul Jeon, Mun Ja Kim, Sung Won Kwon, Chang-Young Jeong | 2019-10-08 |
| 8673522 | Method for manufacturing photomask and photomask manufactured using the same | Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee | 2014-03-18 |
| 8522172 | Method of forming photomask using calibration pattern, and photomask having calibration pattern | Young Keun Yoon, Myoung-Soo Lee, Chan-uk Jeon, Hak-Seung Han | 2013-08-27 |
| 8475980 | Methods of forming semiconductor devices using photolithographic shot grouping | Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee | 2013-07-02 |
| 8329381 | Pattern forming method | Jin Sung Choi, Byung-Gook Kim, Sang-Hee Lee | 2012-12-11 |
| 8213722 | Method for inspecting critical dimension uniformity at high speed measurement | Myoung-Soo Lee, Young-Su Sung | 2012-07-03 |
| 8137870 | Method of manufacturing photomask | Myoung-Soo Lee, Young-Su Sung, Min Lee, Dong Gun Lee | 2012-03-20 |
| 7939223 | Photomask using separated exposure technique, method of fabricating photomask, and apparatus for fabricating photomask by using the method | Hak-Seung Han, Seong-woon Choi, Byung-Gook Kim, Sung Ho Park | 2011-05-10 |
| 7897299 | Phase-shift mask and method of forming the same | Gi-Sung Yoon, Sun Young Choi | 2011-03-01 |
| 7865866 | Method of inspecting mask using aerial image inspection apparatus | Min Kyu JI, Sun Young Choi, Hyun-Joo Baik | 2011-01-04 |
| 7754398 | Photo mask having assist pattern and method of fabricating the same | Jeung-woo Lee, Sung-min Huh | 2010-07-13 |
| 7745068 | Binary photomask having a compensation layer | Jin-sik Jung, Woo-Sung Han, Sung-min Huh | 2010-06-29 |
| 7745072 | Method of correcting critical dimension in photomask and photomask having corrected critical dimension using the method | Jin-sik Jung, Hoon Kim, Sung-min Huh | 2010-06-29 |
| 7736838 | Methods for forming pattern using electron beam and cell masks used in electron beam lithography | Seong-woon Choi | 2010-06-15 |
| 7642017 | Reflective photomask, method of fabricating the same, and reflective blank photomask | Sung-min Huh | 2010-01-05 |
| 7601467 | Method of manufacturing EUVL alternating phase-shift mask | Sung-min Huh, Seong-woon Choi, Dong-Wan Kim, Chan-uk Jeon | 2009-10-13 |
| 7525089 | Method of measuring a critical dimension of a semiconductor device and a related apparatus | Yo Han Choi | 2009-04-28 |
| 6767672 | Method for forming a phase-shifting mask for semiconductor device manufacture | Ji Suk Hong, Sang Sool Koo | 2004-07-27 |
| 6049660 | Simulation method in lithographic process | Chang Nam Ahn | 2000-04-11 |
| 5773171 | Phase shift mask for forming contact holes | Il Ho Lee | 1998-06-30 |