Issued Patents All Time
Showing 26–44 of 44 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7027130 | Device and method for determining an illumination intensity profile of an illuminator for a lithography system | Christopher A. Spence, Todd P. Lukanc, Joerg Reiss, Sarah N. McGowan | 2006-04-11 |
| 7015148 | Reduce line end pull back by exposing and etching space after mask one trim and etch | Todd P. Lukanc, Christopher A. Spence, Joerg Reiss, Sarah N. McGowan | 2006-03-21 |
| 6995433 | Microdevice having non-linear structural component and method of fabrication | Todd P. Lukanc, Sarah N. McGowan, Bhanwar Singh, Joerg Reiss | 2006-02-07 |
| 6978438 | Optical proximity correction (OPC) technique using generalized figure of merit for photolithograhic processing | — | 2005-12-20 |
| 6974652 | Lithographic photomask and method of manufacture to improve photomask test measurement | Todd P. Lukanc, Bhanwar Singh, Christopher A. Spence | 2005-12-13 |
| 6583041 | Microdevice fabrication method using regular arrays of lines and spaces | — | 2003-06-24 |
| 6562639 | Utilizing electrical performance data to predict CD variations across stepper field | Anna M. Minvielle, Christopher A. Spence | 2003-05-13 |
| 6553562 | Method and apparatus for generating masks utilized in conjunction with dipole illumination techniques | Juan Andres Torres Robles, Lodewijk Hubertus Van Os | 2003-04-22 |
| 6492066 | Characterization and synthesis of OPC structures by fourier space analysis and/or wavelet transform expansion | Christopher A. Spence | 2002-12-10 |
| 6458606 | Etch bias distribution across semiconductor wafer | Marina V. Plat, Scott A. Bell, Todd P. Lukanc | 2002-10-01 |
| 6272392 | Methodology for extracting effective lens aberrations using a neural network | — | 2001-08-07 |
| 6262435 | Etch bias distribution across semiconductor wafer | Marina V. Plat, Scott A. Bell, Todd P. Lukanc | 2001-07-17 |
| 6187483 | Mask quality measurements by fourier space analysis | Christopher A. Spence | 2001-02-13 |
| 6115108 | Illumination modification scheme synthesis using lens characterization data | — | 2000-09-05 |
| 6044007 | Modification of mask layout data to improve writeability of OPC | — | 2000-03-28 |
| 6040118 | Critical dimension equalization across the field by second blanket exposure at low dose over bleachable resist | — | 2000-03-21 |
| 6037082 | Design of a new phase shift mask with alternating chrome/phase structures | — | 2000-03-14 |
| 6013396 | Fabrication of chrome/phase grating phase shift mask by interferometric lithography | — | 2000-01-11 |
| 5717612 | Post-exposure bake simulator for chemically amplified photoresists | — | 1998-02-10 |