Issued Patents All Time
Showing 26–50 of 58 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10007744 | Process based metrology target design | Guangqing Chen, Shufeng Bai, Eric Kent, Yen-Wen Lu, Paul Anthony Tuffy +3 more | 2018-06-26 |
| 8918742 | Methods and systems for pattern design with tailored response to wavefront aberration | Hanying Feng, Yu Cao, Jun Ye | 2014-12-23 |
| 8782574 | System for simplifying layout processing | Weinong Lai | 2014-07-15 |
| 8739082 | Method of pattern selection for source and mask optimization | Hua-Yu Liu, Luoqi Chen, Hong Chen, Zhi-Pan Li, Jun Ye +3 more | 2014-05-27 |
| 8281264 | Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction | — | 2012-10-02 |
| 7934184 | Integrated circuit design using modified cells | — | 2011-04-26 |
| 7926004 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Christophe Pierrat | 2011-04-12 |
| 7908572 | Creating and applying variable bias rules in rule-based optical proximity correction for reduced complexity | — | 2011-03-15 |
| 7627837 | Model-based pattern characterization to generate rules for rule-model-based hybrid optical proximity correction | — | 2009-12-01 |
| 7585600 | Method and apparatus for performing target-image-based optical proximity correction | — | 2009-09-08 |
| 7562319 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Christophe Pierrat | 2009-07-14 |
| 7533363 | System for integrated circuit layout partition and extraction for independent layout processing | Weinong Lai | 2009-05-12 |
| 7523429 | System for designing integrated circuits with enhanced manufacturability | Armen Kroyan, Etsuya Morita, Adrianus Ligtenberg | 2009-04-21 |
| 7487490 | System for simplifying layout processing | Weinong Lai | 2009-02-03 |
| 7382912 | Method and apparatus for performing target-image-based optical proximity correction | — | 2008-06-03 |
| 7236916 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask | Christophe Pierrat | 2007-06-26 |
| 7131101 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Christophe Pierrat | 2006-10-31 |
| 7005218 | Method and apparatus for performing target-image-based optical proximity correction | — | 2006-02-28 |
| 7003757 | Dissection of edges with projection points in a fabrication layout for correcting proximity effects | Christophe Pierrat | 2006-02-21 |
| 7003756 | Method and apparatus for controlling rippling during optical proximity correction | — | 2006-02-21 |
| 7000208 | Repetition recognition using segments | — | 2006-02-14 |
| 6918104 | Dissection of printed edges from a fabrication layout for correcting proximity effects | Christophe Pierrat | 2005-07-12 |
| 6792590 | Dissection of edges with projection points in a fabrication layout for correcting proximity effects | Christophe Pierrat | 2004-09-14 |
| 6777138 | Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout | Christophe Pierrat | 2004-08-17 |
| 6763514 | Method and apparatus for controlling rippling during optical proximity correction | — | 2004-07-13 |