Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10565702 | Dynamic updates for the inspection of integrated circuits | Zhaoli Zhang, Jie Lin, Zongchang Yu | 2020-02-18 |
| 10423745 | Correction for flare effects in lithography system | Jiangwei Li, Luoqi Chen, Wei-Cheng Liu, Jiong Jiang | 2019-09-24 |
| 10133838 | Guided defect detection of integrated circuits | Jie Lin, Zhaoli Zhang, Zongchang Yu | 2018-11-20 |
| 9940427 | Lens heating aware source mask optimization for advanced lithography | Michael M. Crouse, Youri Johannes Laurentius Maria Van Dommelen, Peng Liu, Aiqin JIANG, Wenjin Huang | 2018-04-10 |
| 9934350 | Pattern selection for full-chip source and mask optimization | — | 2018-04-03 |
| 9183324 | Pattern selection for full-chip source and mask optimization | — | 2015-11-10 |
| 8887104 | Correction for flare effects in lithography system | Jiangwei Li, Luoqi Chen, Wei-Cheng Liu, Jiong Jiang | 2014-11-11 |
| 8739082 | Method of pattern selection for source and mask optimization | Luoqi Chen, Hong Chen, Zhi-Pan Li, Jun Ye, Min-Chun Tsai +3 more | 2014-05-27 |
| 8543947 | Selection of optimum patterns in a design layout based on diffraction signature analysis | Luoqi Chen, Hong Chen, Zhi-Pan Li | 2013-09-24 |
| D689039 | Stereo set | — | 2013-09-03 |
| 8438508 | Pattern selection for full-chip source and mask optimization | — | 2013-05-07 |
| 8245160 | System and method for creating a focus-exposure model of a lithography process | Jun Ye, Yu Cao, Luoqi Chen | 2012-08-14 |
| 8065636 | System and method for creating a focus-exposure model of a lithography process | Jun Ye, Yu Cao, Luoqi Chen | 2011-11-22 |
| 7747978 | System and method for creating a focus-exposure model of a lithography process | Jun Ye, Yu Cao, Luoqi Chen | 2010-06-29 |
| 7251377 | Cell library that can automatically avoid forbidden pitches | — | 2007-07-31 |
| 7178128 | Alternating phase shift mask design conflict resolution | Christophe Pierrat, Kent Richardson | 2007-02-13 |
| 7082596 | Simulation-based selection of evaluation points for model-based optical proximity correction | — | 2006-07-25 |
| 6944844 | System and method to determine impact of line end shortening | — | 2005-09-13 |
| 6859918 | Alleviating line end shortening by extending phase shifters | Melody W. Ma | 2005-02-22 |
| 6830854 | System and method for correcting 3D effects in an alternating phase-shifting mask | Yong Liu | 2004-12-14 |
| 6813759 | Hybrid optical proximity correction for alternating aperture phase shifting designs | Weinong Lai, Xiaoyang Li | 2004-11-02 |
| 6704921 | Automated flow in PSM phase assignment | — | 2004-03-09 |
| 6684382 | Microloading effect correction | — | 2004-01-27 |
| 6670082 | System and method for correcting 3D effects in an alternating phase-shifting mask | Yong Liu | 2003-12-30 |
| 6664009 | Method and apparatus for allowing phase conflicts in phase shifting mask and chromeless phase edges | — | 2003-12-16 |