JJ

Jiong Jiang

AB Asml Netherlands B.V.: 2 patents #1,484 of 3,192Top 50%
📍 Sunnyvale, CA: #7,978 of 14,302 inventorsTop 60%
🗺 California: #185,134 of 386,348 inventorsTop 50%
Overall (All Time): #2,061,407 of 4,157,543Top 50%
2
Patents All Time

Issued Patents All Time

Showing 1–2 of 2 patents

Patent #TitleCo-InventorsDate
10423745 Correction for flare effects in lithography system Hua-Yu Liu, Jiangwei Li, Luoqi Chen, Wei-Cheng Liu 2019-09-24
8887104 Correction for flare effects in lithography system Hua-Yu Liu, Jiangwei Li, Luoqi Chen, Wei-Cheng Liu 2014-11-11