Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11594528 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2023-02-28 |
| 11150561 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-10-19 |
| 11024623 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-06-01 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-12-22 |
| 10720419 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-21 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-14 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-05-05 |
| 10366973 | Layout modification method for exposure manufacturing process | Hung-Wen Cho, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2019-07-30 |
| 10146141 | Lithography process and system with enhanced overlay quality | Chi-Cheng Hung, Wei-Liang Lin, Yung-Sung Yen, Chun-Kuang Chen, Ru-Gun Liu +6 more | 2018-12-04 |
| 9360778 | System and method for lithography patterning | Li-Jui Chen, Hsueh-Hung Wu | 2016-06-07 |
| 9360767 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Chih-Ming Ke, Li-Jui Chen, Tzung-Chi Fu | 2016-06-07 |
| 9158209 | Method of overlay prediction | Li-Jui Chen, Hung-Chang Hsieh | 2015-10-13 |
| 9025130 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Tzung-Chi Fu, Li-Jui Chen, Chih-Ming Ke | 2015-05-05 |
| 8592107 | Method and apparatus of providing overlay | Guo-Tsai Huang, Li-Jui Chen, Chih-Ming Ke | 2013-11-26 |
| 8520189 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Tzung-Chi Fu, Li-Jiu Chen, Chih-Ming Ke | 2013-08-27 |
| 8329360 | Method and apparatus of providing overlay | Guo-Tsai Huang, Li-Jui Chen, Chih-Ming Ke | 2012-12-11 |
| 7939222 | Method and system for improving printing accuracy of a contact layout | Jhun Hua Chen, Hua-Tai Lin, Lai Chien Wen | 2011-05-10 |
| 7723014 | System and method for photolithography in semiconductor manufacturing | Kuei-Shun Chen, Chin-Hsiang Lin, Tsai-Cheng Gau, Chun-Kung Chen, Hsiao-Tzu Lu | 2010-05-25 |
| 7675604 | Hood for immersion lithography | Li-Jui Chen, Tzung-Chi Fu, Ching-Yu Chang, Lin-Hung Shiu, Chun-Kuang Chen +1 more | 2010-03-09 |
| 7666576 | Exposure scan and step direction optimization | Lin-Hung Shiu, Chun-Kuang Chen, Tsai-Sheng Gau, Burn Jeng Lin | 2010-02-23 |
| 6982135 | Pattern compensation for stitching | Chung-Hsing Chang, Chien-Hung Lin, Burn Jeng Lin, Chia-Hui Lin, Chih-Cheng Chin +3 more | 2006-01-03 |