Issued Patents All Time
Showing 1–9 of 9 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11594528 | Layout modification method for exposure manufacturing process | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2023-02-28 |
| 11150561 | Method and apparatus for collecting information used in image-error compensation | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-10-19 |
| 11024623 | Layout modification method for exposure manufacturing process | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2021-06-01 |
| 10871713 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-12-22 |
| 10720419 | Layout modification method for exposure manufacturing process | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-21 |
| 10712651 | Method and apparatus for collecting information used in image-error compensation | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-07-14 |
| 10642158 | Method of controlling reticle masking blade positioning to minimize impact on critical dimension uniformity and device for controlling reticle masking blade positioning | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2020-05-05 |
| 10366973 | Layout modification method for exposure manufacturing process | Fu-Jye Liang, Chun-Kuang Chen, Chih-Tsung Shih, Li-Jui Chen, Po-Chung Cheng +1 more | 2019-07-30 |
| 10276375 | Assistant pattern for measuring critical dimension of main pattern in semiconductor manufacturing | Wen-Chen Lu, Chaos Tsai, Feng-Jia Shiu | 2019-04-30 |