Issued Patents All Time
Showing 26–49 of 49 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9025130 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Fu-Jye Liang, Tzung-Chi Fu, Li-Jui Chen | 2015-05-05 |
| 8837810 | System and method for alignment in semiconductor device fabrication | Yen-Liang Chen, Te-Chih Huang, Chen-Ming Wang, Tsai-Sheng Gau | 2014-09-16 |
| 8755045 | Detecting method for forming semiconductor device | Jyuh-Fuh Lin, Te-Chih Huang, Guo-Tsai Huang, Jia-Rui Hu | 2014-06-17 |
| 8592107 | Method and apparatus of providing overlay | Guo-Tsai Huang, Fu-Jye Liang, Li-Jui Chen | 2013-11-26 |
| 8520189 | Method and apparatus for maintaining depth of focus | Chang-Tsun Hsieh, Fu-Jye Liang, Tzung-Chi Fu, Li-Jiu Chen | 2013-08-27 |
| 8329360 | Method and apparatus of providing overlay | Guo-Tsai Huang, Fu-Jye Liang, Li-Jui Chen | 2012-12-11 |
| 8179536 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Tsai-Sheng Gau | 2012-05-15 |
| 8027529 | System for improving critical dimension uniformity | Shinn-Sheng Yu, Jacky Huang, Chun-Kuang Chen, Tsai-Sheng Gau | 2011-09-27 |
| 7897297 | Method and system for optimizing intra-field critical dimension uniformity using a sacrificial twin mask | Tsai-Sheng Gau, Shinn-Sheng Yu, Hung-Chang Hsieh | 2011-03-01 |
| 7858404 | Measurement of overlay offset in semiconductor processing | Te-Chih Huang, Tsai-Sheng Gau | 2010-12-28 |
| 7796249 | Mask haze early detection | Wen-Chuan Wang, Shy-Jay Lin, Te-Chih Huang, Wei-Yu Su, Heng-Hsin Liu +2 more | 2010-09-14 |
| 7777884 | Method and system for optimizing sub-nanometer critical dimension using pitch offset | Shinn-Sheng Yu, Yu-Hsi Wang, Jacky Huang, Tsai-Sheng Gau, Kuo-Chen Huang | 2010-08-17 |
| 7751025 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Bang-Ching Ho, Jen-Chieh Shih, Tsai-Sheng Gau | 2010-07-06 |
| 7732109 | Method and system for improving critical dimension uniformity | Shinn-Sheng Yu, Jacky Huang, Chun-Kuang Chen, Tsai-Sheng Gau | 2010-06-08 |
| 7580129 | Method and system for improving accuracy of critical dimension metrology | Shinn-Sheng Yu, Jacky Huang, Tsai-Sheng Gau | 2009-08-25 |
| 7393616 | Line end spacing measurement | Jiann Yuan Huang, Anderson Chang, Heng-Jen Lee, Chin-Hsiang Lin, Tsai-Sheng Gau | 2008-07-01 |
| 7356380 | Process control method | Shing-Sheng Yu, Burn Jeng Lin | 2008-04-08 |
| 7349086 | Systems and methods for optical measurement | Joung-Wei Liou, Jacky Huang, Szu-An Wu | 2008-03-25 |
| 7259850 | Approach to improve ellipsometer modeling accuracy for solving material optical constants N & K | Pei-Hung Chen, Shinn-Sheng Yu | 2007-08-21 |
| 7252909 | Method to reduce CD non-uniformity in IC manufacturing | Jaw-Jung Shin, Burn Jeng Lin | 2007-08-07 |
| 7135259 | Scatterometric method of monitoring hot plate temperature and facilitating critical dimension control | Li-Jui Chen, Bang-Ching Ho, Jen-Chieh Shih, Tsai-Sheng Gau | 2006-11-14 |
| 6979820 | CD SEM automatic focus methodology and apparatus for constant electron beam dosage control | Chien-Hsun Lin, Yao-Ching Ku | 2005-12-27 |
| 6774044 | Reducing photoresist shrinkage via plasma treatment | Tsai-Sheng Giau, Jaw-Jung Shin, Anthony Yen | 2004-08-10 |
| 6083834 | Zincate catalysis electroless metal deposition for via metal interconnection | Jieh-Ting Chang, Yun-Hung Shen | 2000-07-04 |