TE

Takafumi Endo

NI Nissan Chemical Industries: 52 patents #7 of 1,150Top 1%
Mitsubishi Electric: 24 patents #727 of 25,717Top 3%
UN Unipres: 1 patents #21 of 67Top 35%
📍 Toyama, JP: #9 of 1,699 inventorsTop 1%
Overall (All Time): #24,103 of 4,157,543Top 1%
77
Patents All Time

Issued Patents All Time

Showing 26–50 of 77 patents

Patent #TitleCo-InventorsDate
11155684 Photocrosslinkable group-containing composition for coating stepped substrate Rikimaru Sakamoto, Tadashi Hatanaka 2021-10-26
10871712 Stepped substrate-coating composition containing polyether resin having photocrosslinkable group Hikaru TOKUNAGA, Keisuke Hashimoto, Rikimaru Sakamoto 2020-12-22
10809619 Resist underlayer film-forming composition containing substituted crosslinkable compound Keisuke Hashimoto, Kenji Takase, Tetsuya Shinjo, Rikimaru Sakamoto, Hirokazu Nishimaki 2020-10-20
10508181 Bottom layer film-formation composition of self-organizing film containing polycyclic organic vinyl compound Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto 2019-12-17
10437150 Composition for forming resist underlayer film with reduced outgassing Rikimaru Sakamoto, Bangching Ho 2019-10-08
10394124 Resist underlayer film-forming composition containing polymer having arylene group Keisuke Hashimoto, Rikimaru Sakamoto, Hirokazu Nishimaki 2019-08-27
10295907 Resist underlayer film-forming composition for lithography containing polymer having acrylamide structure and acrylic acid ester structure Ryo Karasawa, Yasunobu Someya, Tokio NISHITA, Rikimaru Sakamoto 2019-05-21
10280328 Bottom layer film-forming composition of self-organizing film containing styrene structure Yasunobu Someya, Hiroyuki Wakayama, Rikimaru Sakamoto 2019-05-07
10191374 Resist underlayer film-forming composition Hirokazu Nishimaki, Keisuke Hashimoto, Rikimaru Sakamoto 2019-01-29
10133178 Coating liquid for resist pattern coating Tokio NISHITA, Shuhei Shigaki, Noriaki Fujitani, Rikimaru Sakamoto 2018-11-20
10042258 Composition for forming a resist upper-layer film and method for producing a semiconductor device using the composition Noriaki Fujitani, Rikimaru Sakamoto 2018-08-07
10017664 Novolac resin-containing resist underlayer film-forming composition using bisphenol aldehyde Keisuke Hashimoto, Hirokazu Nishimaki, Rikimaru Sakamoto 2018-07-10
9927705 Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same Noriaki Fujitani, Ryuji Ohnishi, Rikimaru Sakamoto 2018-03-27
9469777 Resist underlayer film forming composition that contains novolac resin having polynuclear phenol Tetsuya Shinjo, Keisuke Hashimoto, Yasunobu Someya, Hirokazu Nishimaki, Ryo Karasawa +1 more 2016-10-18
9395628 Resist underlayer film-forming composition containing aryl sulfonate salt having hydroxyl group Keisuke Hashimoto, Hirokazu Nishimaki, Rikimaru Sakamoto 2016-07-19
9250525 Resist underlayer film-forming composition Rikimaru Sakamoto, Noriaki Fujitani 2016-02-02
9244353 Resist underlayer film forming composition Hirokazu Nishimaki, Keisuke Hashimoto, Tetsuya Shinjo, Rikimaru Sakamoto 2016-01-26
9240327 Resist underlayer film-forming composition for EUV lithography containing condensation polymer Rikimaru Sakamoto, Noriaki Fujitani, Ryuji Ohnishi, Bangching Ho 2016-01-19
9224258 Image reading device Yohei Nokami, Shigeru Toyota 2015-12-29
9212255 Resist underlayer film-forming composition Rikimaru Sakamoto, Noriaki Fujitani 2015-12-15
9195137 Composition for forming highly adhesive resist underlayer film Rikimaru Sakamoto, Noriaki Fujitani 2015-11-24
9165782 Additive for resist underlayer film-forming composition and resist underlayer film-forming composition containing the same Rikimaru Sakamoto, Noriaki Fujitani 2015-10-20
9046768 Resist overlayer film forming composition for lithography Ryuji Ohnishi, Rikimaru Sakamoto 2015-06-02
9005873 Composition for forming resist underlayer film for EUV lithography Rikimaru Sakamoto, Bangching Ho 2015-04-14
8962234 Resist underlayer film forming composition and method for forming resist pattern using the same Ryuji Ohnishi, Rikimaru Sakamoto 2015-02-24