MN

Makoto Nakajima

NI Nissan Chemical Industries: 55 patents #5 of 1,150Top 1%
SL Suntory Holdings Limited: 8 patents #67 of 846Top 8%
FM Fujikoshi Machinery: 6 patents #11 of 85Top 15%
Mitsubishi Electric: 5 patents #5,859 of 25,717Top 25%
JC Janome Sewing Machine Co.: 5 patents #49 of 229Top 25%
FK Fujikoshi Kikai Kogyo Kabushiki Kaisha: 3 patents #2 of 23Top 9%
FU Fujifilm: 2 patents #2,431 of 4,519Top 55%
KA Kajima: 2 patents #67 of 383Top 20%
TT The University Of Tokyo: 2 patents #500 of 2,633Top 20%
TL Tokyo Electron Limited: 2 patents #2,602 of 5,567Top 50%
TK Toshiba Tec Kabushiki Kaisha: 2 patents #886 of 1,664Top 55%
OU Osaka University: 2 patents #362 of 1,984Top 20%
NE Nec: 2 patents #5,510 of 14,502Top 40%
NP Nec Platforms: 1 patents #114 of 361Top 35%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
HI Hitachi: 1 patents #17,742 of 28,497Top 65%
AC Advanced Technology & Materials Co.: 1 patents #255 of 410Top 65%
NC Nippon Fine Chemical Co.: 1 patents #13 of 29Top 45%
Nissan Motor Co.: 1 patents #4,519 of 8,689Top 55%
SC Shin-Etsu Handotai Co.: 1 patents #385 of 679Top 60%
Samsung: 1 patents #49,284 of 75,807Top 70%
📍 Toyama, JP: #5 of 1,699 inventorsTop 1%
Overall (All Time): #14,731 of 4,157,543Top 1%
99
Patents All Time

Issued Patents All Time

Showing 51–75 of 99 patents

Patent #TitleCo-InventorsDate
9760006 Silicon-containing resist underlayer film forming composition having urea group Yuta Kanno, Wataru SHIBAYAMA 2017-09-12
9725618 Metal-containing resist underlayer film-forming composition containing polyacid Wataru SHIBAYAMA, Hiroyuki Wakayama, Satoshi Takeda 2017-08-08
9670608 Sewing machine Mikio Koike 2017-06-06
9624611 Sewing machine Mikio Koike, Jun MAFUNE 2017-04-18
9613036 Magnetic tape drive apparatus, magnetic tape drive system, and magnetic tape drive method Hajime Nonaka, Muneyuki Yoshikawa, Yuuki HAYAKAWA 2017-04-04
9524871 Silicon-containing resist underlayer film-forming composition having sulfone structure Daisuke SAKUMA, Yuta Kanno, Takahiro Kishioka 2016-12-20
9494862 Resist underlayer film forming composition containing silicon having sulfone structure and amine structure Yuta Kanno, Kenji Takase, Satoshi Takeda, Hiroyuki Wakayama 2016-11-15
9290623 Composition for forming silicon-containing resist underlayer film having cyclic diester group Yuta Kanno, Daisuke SAKUMA, Kenji Takase, Shuhei Shigaki 2016-03-22
9291900 Composition for forming resist underlayer film, containing silicon that bears diketone-structure-containing organic group Yuta Kanno, Daisuke SAKUMA 2016-03-22
9217921 Resist underlayer film forming composition containing silicon having sulfide bond Yuta Kanno, Wataru SHIBAYAMA 2015-12-22
9196484 Silicon-containing composition for formation of resist underlayer film, which contains organic group containing protected aliphatic alcohol Satoshi Takeda, Yuta Kanno 2015-11-24
9093279 Thin film forming composition for lithography containing titanium and silicon Yuta Kanno, Satoshi Takeda, Yasushi Sakaida, Shuhei Shigaki 2015-07-28
9023588 Resist underlayer film forming composition containing silicon having nitrogen-containing ring Yuta Kanno, Wataru SHIBAYAMA 2015-05-05
8903032 Structure for suppressing flow vibration of instrumentation guide tube Nobuki Uda, Shigeyuki Watanabe, Kazuo Hirota, Hideyuki Sakata, Hideyuki Morita +2 more 2014-12-02
8877425 Silicon-containing resist underlayer film forming composition having fluorine-based additive Yuta Kanno, Tomoko Misaki, Motonobu Matsuyama, Masayuki Haraguchi 2014-11-04
8864894 Resist underlayer film forming composition containing silicone having onium group Wataru SHIBAYAMA, Yuta Kanno 2014-10-21
8835093 Resist underlayer film forming composition containing silicon having anion group Wataru SHIBAYAMA, Yuta Kanno 2014-09-16
8828879 Silicon-containing composition having sulfonamide group for forming resist underlayer film Yuta Kanno, Wataru SHIBAYAMA 2014-09-09
8815494 Resist underlayer film forming composition containing silicon having anion group Wataru SHIBAYAMA, Yuta Kanno 2014-08-26
8470406 Method of spray application, and spray apparatus, for bentonite material Ichizo Kobayashi, Takeshi Sasakura, Toshiyuki Tanaka, Masaru Toida, Takahisa Isobe 2013-06-25
8426112 Resist underlayer film forming composition containing polymer having nitrogen-containing silyl group Wataru SHIBAYAMA, Yuta Kanno 2013-04-23
8419074 Joint structure Shinjiro Inomata 2013-04-16
8283103 Composition for forming resist underlayer film for lithography and production method of semiconductor device Hikaru Imamura, Yasushi Sakaida, Satoshi Takei 2012-10-09
8163460 Underlayer coating forming composition for lithography containing polysilane compound Satoshi Takei, Keisuke Hashimoto 2012-04-24
8140793 Virtual tape device, data backup method, and recording medium Hajime Nonaka, Yoshiaki Mori, Muneyuki Yoshikawa 2012-03-20