| 8920567 |
Post metal chemical-mechanical planarization cleaning process |
Vamsi Devarapalli, Colin J. Goyette, Michael R. Kennett, Mahmoud Khojasteh, Qinghuang Lin +2 more |
2014-12-30 |
| 6667521 |
Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit |
David C. Ahlgren, Gregory G. Freeman, Feng-Yi Huang |
2003-12-23 |
| 6500054 |
Chemical-mechanical polishing pad conditioner |
William H. Ma |
2002-12-31 |
| 6492238 |
Bipolar transistor with raised extrinsic base fabricated in an integrated BiCMOS circuit |
David C. Ahlgren, Gregory G. Freeman, Feng-Yi Huang |
2002-12-10 |
| 6325696 |
Piezo-actuated CMP carrier |
Karl E. Boggs, Kenneth M. Davis, William Francis Landers, Michael F. Lofaro, Ronald D. Fiege |
2001-12-04 |
| 6296717 |
Regeneration of chemical mechanical polishing pads in-situ |
Karl E. Boggs, Kenneth M. Davis, William Francis Landers, Michael L. Passow |
2001-10-02 |
| 5968841 |
Device and method for preventing settlement of particles on a chemical-mechanical polishing pad |
William Francis Landers, Michael F. Lofaro |
1999-10-19 |
| 5897425 |
Vertical polishing tool and method |
Thomas R. Fisher, Jr., Carol E. Gustafson, William Francis Landers, John Carlo Minunni, Jr., Thomas E. Sandwick |
1999-04-27 |
| 5267418 |
Confined water fixture for holding wafers undergoing chemical-mechanical polishing |
James E. Currie, Ronald N. Schulz |
1993-12-07 |
