Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8877549 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2014-11-04 |
| 8802882 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2014-08-12 |
| 8796068 | Tellurium compounds useful for deposition of tellurium containing materials | Matthias Stender, Chongying Xu, William Hunks, Philip S. H. Chen, Jeffrey F. Roeder +1 more | 2014-08-05 |
| 8784936 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2014-07-22 |
| 8709863 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2014-04-29 |
| 8679894 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2014-03-25 |
| 8674127 | Antimony compounds useful for deposition of antimony-containing materials | William Hunks, Philip S. H. Chen, Chongying Xu, Leah Maylott | 2014-03-18 |
| 8524931 | Precursor compositions for ALD/CVD of group II ruthenate thin films | Chongying Xu, Bryan C. Hendrix, Thomas M. Cameron, Jeffrey F. Roeder, Matthias Stender | 2013-09-03 |
| 8288198 | Low temperature deposition of phase change memory materials | Jeffrey F. Roeder, Thomas H. Baum, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu +2 more | 2012-10-16 |
| 8268665 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Matthias Stender +3 more | 2012-09-18 |
| 8206784 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2012-06-26 |
| 8168811 | Precursors for CVD/ALD of metal-containing films | Thomas M. Cameron, Chongying Xu | 2012-05-01 |
| 8093140 | Amorphous Ge/Te deposition process | Philip S. H. Chen, William Hunks, Matthias Stender, Chongying Xu, Jeffrey F. Roeder +1 more | 2012-01-10 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Steven M. Bilodeau, Scott L. Battle +1 more | 2011-11-08 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2011-08-30 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Chongying Xu, Thomas H. Baum, Bryan C. Hendrix, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7858816 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum | 2010-12-28 |
| 7838073 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Chongying Xu, Thomas H. Baum | 2010-11-23 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum, Melissa A. Petruska +4 more | 2010-11-23 |
| 7781605 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2010-08-24 |
| 7750173 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Chongying Xu, Jeffrey F. Roeder, Thomas H. Baum | 2010-07-06 |
| 7709384 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Chongying Xu, Thomas H. Baum | 2010-05-04 |
| 7638074 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Thomas M. Cameron, Jeffrey F. Roeder, Thomas H. Baum | 2009-12-29 |
| 7601860 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2009-10-13 |
| 7423166 | Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films | Chongying Xu, Thomas H. Baum, Ravi Laxman, Alexander Borovik | 2008-09-09 |