| 12297217 |
Process for preparing organotin compounds |
David M. Ermert, David Kuiper, Thomas H. Baum |
2025-05-13 |
| 12221691 |
Organotin precursor compounds |
David M. Ermert, David Kuiper |
2025-02-11 |
| 11685752 |
Process for preparing organotin compounds |
David M. Ermert, Thomas H. Baum |
2023-06-27 |
| 11358975 |
Process for preparing organotin compounds |
David M. Ermert, David Kuiper, Thomas H. Baum |
2022-06-14 |
| 11203604 |
Preparation of triiodosilanes |
David Kuiper, Manish Khandelwal, Thomas H. Baum, John Cleary |
2021-12-21 |
| 10870921 |
Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2 |
William Hunks |
2020-12-22 |
| 9929014 |
Dopant precursors for mono-layer doping |
Emanuel I. Cooper, Sung Han |
2018-03-27 |
| 9534285 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films |
Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum |
2017-01-03 |
| 9443736 |
Silylene compositions and methods of use thereof |
Susan DiMeo, Bryan C. Hendrix, Weimin Li |
2016-09-13 |
| 9373677 |
Doping of ZrO2 for DRAM applications |
Julie Cissell, Chongying Xu, William Hunks, David W. Peters |
2016-06-21 |
| 8784936 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films |
Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum |
2014-07-22 |
| 8663735 |
In situ generation of RuO4 for ALD of Ru and Ru related materials |
Chongying Xu, Weimin Li |
2014-03-04 |
| 8574675 |
Method and composition for depositing ruthenium with assistive metal species |
Jorge A. Lubguban, Chongying Xu, Weimin Li |
2013-11-05 |
| 8524931 |
Precursor compositions for ALD/CVD of group II ruthenate thin films |
Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Matthias Stender, Tianniu Chen |
2013-09-03 |
| 8455049 |
Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition |
Chongying Xu |
2013-06-04 |
| 8329140 |
Method and system for hydrogen evolution and storage |
David L. Thorn, William Tumas, P. Jeffrey Hay, Daniel E. Schwarz |
2012-12-11 |
| 8206784 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films |
Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum |
2012-06-26 |
| 8168811 |
Precursors for CVD/ALD of metal-containing films |
Chongying Xu, Tianniu Chen |
2012-05-01 |
| 7638074 |
Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films |
Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum |
2009-12-29 |
| 7439369 |
Method and system for hydrogen evolution and storage |
David L. Thorn, William Tumas, P. Jeffrey Hay, Daniel E. Schwarz |
2008-10-21 |