Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12297217 | Process for preparing organotin compounds | David M. Ermert, David Kuiper, Thomas H. Baum | 2025-05-13 |
| 12221691 | Organotin precursor compounds | David M. Ermert, David Kuiper | 2025-02-11 |
| 11685752 | Process for preparing organotin compounds | David M. Ermert, Thomas H. Baum | 2023-06-27 |
| 11358975 | Process for preparing organotin compounds | David M. Ermert, David Kuiper, Thomas H. Baum | 2022-06-14 |
| 11203604 | Preparation of triiodosilanes | David Kuiper, Manish Khandelwal, Thomas H. Baum, John Cleary | 2021-12-21 |
| 10870921 | Cyclopentadienyl titanium alkoxides with ozone activated ligands for ALD of TiO2 | William Hunks | 2020-12-22 |
| 9929014 | Dopant precursors for mono-layer doping | Emanuel I. Cooper, Sung Han | 2018-03-27 |
| 9534285 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2017-01-03 |
| 9443736 | Silylene compositions and methods of use thereof | Susan DiMeo, Bryan C. Hendrix, Weimin Li | 2016-09-13 |
| 9373677 | Doping of ZrO2 for DRAM applications | Julie Cissell, Chongying Xu, William Hunks, David W. Peters | 2016-06-21 |
| 8784936 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2014-07-22 |
| 8663735 | In situ generation of RuO4 for ALD of Ru and Ru related materials | Chongying Xu, Weimin Li | 2014-03-04 |
| 8574675 | Method and composition for depositing ruthenium with assistive metal species | Jorge A. Lubguban, Chongying Xu, Weimin Li | 2013-11-05 |
| 8524931 | Precursor compositions for ALD/CVD of group II ruthenate thin films | Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Matthias Stender, Tianniu Chen | 2013-09-03 |
| 8455049 | Strontium precursor for use in chemical vapor deposition, atomic layer deposition and rapid vapor deposition | Chongying Xu | 2013-06-04 |
| 8329140 | Method and system for hydrogen evolution and storage | David L. Thorn, William Tumas, P. Jeffrey Hay, Daniel E. Schwarz | 2012-12-11 |
| 8206784 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2012-06-26 |
| 8168811 | Precursors for CVD/ALD of metal-containing films | Chongying Xu, Tianniu Chen | 2012-05-01 |
| 7638074 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Jeffrey F. Roeder, Thomas H. Baum | 2009-12-29 |
| 7439369 | Method and system for hydrogen evolution and storage | David L. Thorn, William Tumas, P. Jeffrey Hay, Daniel E. Schwarz | 2008-10-21 |