Patent Leaderboard
USPTO Patent Rankings Data through Sept 30, 2025
TB

Thomas H. Baum

ACAdvanced Technology & Materials Co.: 184 patents #1 of 410Top 1%
ENEntegris: 55 patents #1 of 643Top 1%
IBM: 16 patents #6,952 of 70,183Top 10%
Infineon Technologies Ag: 5 patents #2,021 of 7,486Top 30%
Siemens Aktiengesellschaft: 2 patents #6,658 of 22,248Top 30%
New Fairfield, CT: #2 of 222 inventorsTop 1%
Connecticut: #11 of 34,797 inventorsTop 1%
Overall (All Time): #1,871 of 4,157,543Top 1%
256 Patents All Time

Issued Patents All Time

Showing 51–75 of 256 patents

Patent #TitleCo-InventorsDate
9422513 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition Melissa K. Rath, David Bernhard, David W. Minsek 2016-08-23
9340878 TPIR apparatus for monitoring tungsten hexafluoride processing to detect gas phase nucleation, and method and system utilizing same Jose I. Arno, Joseph R. Despres, Shkelqim Letaj, Steven M. Lurcott, Peng Zou 2016-05-17
9256134 Photoresist removal David W. Minsek, Melissa K. Rath, David Bernhard 2016-02-09
9219232 Antimony and germanium complexes useful for CVD/ALD of metal thin films William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Matthias Stender +3 more 2015-12-22
9134146 Fluid monitoring apparatus Ing-Shin Chen, Richard Chism 2015-09-15
9109755 Endpoint determination for capillary-assisted flow control Joseph D. Sweeney, Anthony M. Avila, Michael J. Wodjenski, Joseph R. Despres 2015-08-18
9102693 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen 2015-08-11
9038855 Fluid processing systems and methods Steven M. Lurcott, John E. Q. Hughes, Peter Wrschka, Donald D. Ware, Peng Zou 2015-05-26
8951948 Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition Melissa K. Rath, David Bernhard, David W. Minsek 2015-02-10
8882889 Recovery of Xe and other high value compounds J. Donald Carruthers, Richard Fricke, Joshua B. Sweeney, James V. McManus, Edward A. Sturm 2014-11-11
8877549 Low temperature deposition of phase change memory materials Jeffrey F. Roeder, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu, William Hunks +2 more 2014-11-04
8802882 Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen 2014-08-12
8796068 Tellurium compounds useful for deposition of tellurium containing materials Matthias Stender, Chongying Xu, Tianniu Chen, William Hunks, Philip S. H. Chen +1 more 2014-08-05
8784936 Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films Chongying Xu, Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder 2014-07-22
8709863 Antimony and germanium complexes useful for CVD/ALD of metal thin films William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Matthias Stender +3 more 2014-04-29
8679894 Low temperature deposition of phase change memory materials Jeffrey F. Roeder, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu, William Hunks +2 more 2014-03-25
8679734 Photoresist removal David W. Minsek, Melissa K. Rath, David Bernhard 2014-03-25
8541318 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Ziyun Wang, Chongying Xu 2013-09-24
8501976 Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material 2013-08-06
8338087 Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate Melissa K. Rath, David Bernhard, David W. Minsek, Michael B. Korzenski 2012-12-25
8299286 Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition Robin A. Gardiner, Douglas Gordon, Timothy E. Glassman, Sofia Pombrik, Brian A. Vaartstra +1 more 2012-10-30
8288198 Low temperature deposition of phase change memory materials Jeffrey F. Roeder, Bryan C. Hendrix, Gregory T. Stauf, Chongying Xu, William Hunks +2 more 2012-10-16
8268665 Antimony and germanium complexes useful for CVD/ALD of metal thin films William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Matthias Stender +3 more 2012-09-18
8242032 Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same Ziyun Wang, Chongying Xu 2012-08-14
8241704 Chemical vapor deposition of high conductivity, adherent thin films of ruthenium Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu 2012-08-14