Issued Patents All Time
Showing 101–125 of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7709384 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Chongying Xu | 2010-05-04 |
| 7705382 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Jeffrey F. Roeder, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston +1 more | 2010-04-27 |
| 7638074 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder | 2009-12-29 |
| 7605093 | Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor | Chongying Xu | 2009-10-20 |
| 7601860 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen | 2009-10-13 |
| 7579496 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Chongying Xu | 2009-08-25 |
| 7557073 | Non-fluoride containing supercritical fluid composition for removal of ion-implant photoresist | Michael B. Korzenski | 2009-07-07 |
| 7553803 | Enhancement of silicon-containing particulate material removal using supercritical fluid-based compositions | Michael B. Korzenski | 2009-06-30 |
| 7531679 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Bryan C. Hendrix, Jeffrey F. Roeder | 2009-05-12 |
| 7531031 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Alexander Borovik | 2009-05-12 |
| 7517809 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Michael B. Korzenski, Chongying Xu, Eliodor G. Ghenciu | 2009-04-14 |
| 7485611 | Supercritical fluid-based cleaning compositions and methods | Jeffrey F. Roeder, Matthew Healy, Chongying Xu | 2009-02-03 |
| 7475588 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawacz +3 more | 2009-01-13 |
| 7456488 | Porogen material | Chongying Xu, Alexander Borovik | 2008-11-25 |
| 7446217 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2008-11-04 |
| 7439318 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Alexander Borovik, Ziyun Wang, Chongying Xu | 2008-10-21 |
| 7437060 | Delivery systems for efficient vaporization of precursor source material | Luping Wang, Chongying Xu | 2008-10-14 |
| 7427567 | Polishing slurries for copper and associated materials | Willaim A. Wojtczak, Long Nguyen, Cary Regulski | 2008-09-23 |
| 7423166 | Stabilized cyclosiloxanes for use as CVD precursors for low-dielectric constant thin films | Tianniu Chen, Chongying Xu, Ravi Laxman, Alexander Borovik | 2008-09-09 |
| 7371880 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Alexander Borovik | 2008-05-13 |
| 7371878 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Chongying Xu | 2008-05-13 |
| 7361603 | Passivative chemical mechanical polishing composition for copper film planarization | Jun Liu, Mackenzie King, Michael S. Darsillo, Karl E. Boggs, Jeffrey F. Roeder | 2008-04-22 |
| 7344589 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Jeffrey F. Roeder, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston +1 more | 2008-03-18 |
| 7342295 | Porogen material | Chongying Xu, Alexander Borovik | 2008-03-11 |
| 7335239 | Chemical mechanical planarization pad | — | 2008-02-26 |