Issued Patents All Time
Showing 76–100 of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8236695 | Method of passivating chemical mechanical polishing compositions for copper film planarization processes | Jun Liu, Mackenzie King, Michael S. Darsillo, Karl E. Boggs, Jeffrey F. Roeder +1 more | 2012-08-07 |
| 8236485 | Photoresist removal | David W. Minsek, Melissa Murphy, David Bernhard | 2012-08-07 |
| 8236097 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2012-08-07 |
| 8206784 | Precursor compositions for atomic layer deposition and chemical vapor deposition of titanate, lanthanate, and tantalate dielectric films | Chongying Xu, Tianniu Chen, Thomas M. Cameron, Jeffrey F. Roeder | 2012-06-26 |
| 8153833 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Bryan C. Hendrix, Jeffrey F. Roeder | 2012-04-10 |
| 8114220 | Formulations for cleaning ion-implanted photoresist layers from microelectronic devices | Pamela M. Visintin, Michael B. Korzenski | 2012-02-14 |
| 8109130 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2012-02-07 |
| 8058219 | Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant | Melissa K. Rath, David Bernhard, Ping Jiang, Renjie Zhou, Michael B. Korzenski | 2011-11-15 |
| 8053375 | Super-dry reagent compositions for formation of ultra low k films | Chongying Xu, Jeffrey F. Roeder, Steven M. Bilodeau, Scott L. Battle, William Hunks +1 more | 2011-11-08 |
| 8034407 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu | 2011-10-11 |
| 8008117 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Melissa A. Petruska +4 more | 2011-08-30 |
| 7994108 | Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings | David W. Minsek, Weihua Wang, David Bernhard, Melissa K. Rath | 2011-08-09 |
| 7964746 | Copper precursors for CVD/ALD/digital CVD of copper metal films | Tianniu Chen, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Juan E. Dominguez +2 more | 2011-06-21 |
| 7931713 | Chemical mechanical planarization pad | — | 2011-04-26 |
| 7910765 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-03-22 |
| 7887883 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2011-02-15 |
| 7862857 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Jeffrey F. Roeder, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston +1 more | 2011-01-04 |
| 7863203 | Monosilane or disilane derivatives and method for low temperature deposition of silicon-containing films using the same | Ziyun Wang, Chongying Xu | 2011-01-04 |
| 7858816 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder | 2010-12-28 |
| 7838073 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Chongying Xu | 2010-11-23 |
| 7838329 | Antimony and germanium complexes useful for CVD/ALD of metal thin films | William Hunks, Tianniu Chen, Chongying Xu, Jeffrey F. Roeder, Melissa A. Petruska +4 more | 2010-11-23 |
| 7786320 | Composition and method for low temperature deposition of silicon-containing films such as films including silicon, silicon nitride, silicon dioxide and/or silicon-oxynitride | Ziyun Wang, Chongying Xu, Ravi Laxman, Bryan C. Hendrix, Jeffrey F. Roeder | 2010-08-31 |
| 7781605 | Composition and method for low temperature chemical vapor deposition of silicon-containing films including silicon carbonitride and silicon oxycarbonitride films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder, Tianniu Chen | 2010-08-24 |
| 7750173 | Tantalum amido-complexes with chelate ligands useful for CVD and ALD of TaN and Ta205 thin films | Tianniu Chen, Chongying Xu, Jeffrey F. Roeder | 2010-07-06 |
| 7713346 | Composition and method for low temperature deposition of silicon-containing films | Ziyun Wang, Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2010-05-11 |