Issued Patents All Time
Showing 126–150 of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7329768 | Chemical vapor deposition precursors for deposition of tantalum-based materials | Smuruthi Kamepalli | 2008-02-12 |
| 7326673 | Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates | Chongying Xu, David W. Minsek, Matthew Healy | 2008-02-05 |
| 7323581 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition | Robin A. Gardiner, Timothy E. Glassman, Sophia Pombrik, Brian A. Vaastra, Peter S. Kirlin +1 more | 2008-01-29 |
| 7296460 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2007-11-20 |
| 7294528 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | Chongying Xu | 2007-11-13 |
| 7285308 | Chemical vapor deposition of high conductivity, adherent thin films of ruthenium | Bryan C. Hendrix, James Welch, Steven M. Bilodeau, Jeffrey F. Roeder, Chongying Xu | 2007-10-23 |
| 7241912 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Alexander Borovik | 2007-07-10 |
| 7226640 | Method of fabricating iridium-based materials and structures on substrates | Chongying Xu | 2007-06-05 |
| 7223352 | Supercritical carbon dioxide/chemical formulation for ashed and unashed aluminum post-etch residue removal | Michael B. Korzenski, Eliodor G. Ghenciu, Chongying Xu | 2007-05-29 |
| 7208427 | Precursor compositions and processes for MOCVD of barrier materials in semiconductor manufacturing | Jeffrey F. Roeder, Chongying Xu, Bryan C. Hendrix | 2007-04-24 |
| 7198815 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Chongying Xu | 2007-04-03 |
| 7189571 | Method for trace water analysis in cyclic siloxanes useful as precursors for low dielectric constant thin films | Alexander Borovik, Ziyun Wang, Chongying Xu | 2007-03-13 |
| 7166732 | Copper (I) compounds useful as deposition precursors of copper thin films | Chongying Xu, Alexander Borovik | 2007-01-23 |
| 7160815 | Removal of MEMS sacrificial layers using supercritical fluid/chemical formulations | Michael B. Korzenski, Chongying Xu, Eliodor G. Ghenciu | 2007-01-09 |
| 7119052 | Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers | Michael B. Korzenski, Chongying Xu, David W. Minsek, Eliodor G. Ghenciu | 2006-10-10 |
| 7119418 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | Chongying Xu, Michael B. Korzenski | 2006-10-10 |
| 7108771 | Method for removal of impurities in cyclic siloxanes useful as precursors for low dielectric constant thin films | Chongying Xu, Alexander Borovik, Ziyun Wang, James Lin, Scott L. Battle +1 more | 2006-09-19 |
| 7094284 | Source reagent compositions for CVD formation of high dielectric constant and ferroelectric metal oxide thin films and method of using same | Jeffrey F. Roeder, Chongying Xu, Bryan C. Hendrix | 2006-08-22 |
| 7084080 | Silicon source reagent compositions, and method of making and using same for microelectronic device structure | Alexander Borovik, Ziyun Wang, Chongying Xu, Brian L. Benac | 2006-08-01 |
| 7080545 | Apparatus and process for sensing fluoro species in semiconductor processing systems | Frank Dimeo, Jr., Philip S. H. Chen, Jeffrey W. Neuner, James Welch, Michele Stawasz +3 more | 2006-07-25 |
| 7029373 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, William A. Wojtczak, Cary Regulski, David Bernhard, Deepak Verma | 2006-04-18 |
| 7030168 | Supercritical fluid-assisted deposition of materials on semiconductor substrates | Chongying Xu | 2006-04-18 |
| 7029724 | Composition and method for forming doped A-site deficient thin-film manganate layers on a substrate | Galena Doubinina, Daniel Studebaker | 2006-04-18 |
| 7022864 | Ethyleneoxide-silane and bridged silane precursors for forming low k films | Alexander Borovik, Chongying Xu, Steven M. Bilodeau, Jeffrey F. Roeder, Abigail Ebbing +1 more | 2006-04-04 |
| 7011716 | Compositions and methods for drying patterned wafers during manufacture of integrated circuitry products | Chongying Xu, Michael B. Korzenski, Alexander Borovik, Eliodor G. Ghenciu | 2006-03-14 |