Issued Patents All Time
Showing 176–200 of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6623656 | Source reagent composition for CVD formation of Zr/Hf doped gate dielectric and high dielectric constant metal oxide thin films and method of using same | Chongying Xu, Witold Paw, Bryan C. Hendrix, Jeffrey F. Roeder, Ziyun Wang | 2003-09-23 |
| 6602549 | Indium source reagent composition, and use thereof for deposition of indium-containing films on subtrates and ion implantation of indium-doped shallow junction microelectronic structures | Chongying Xu | 2003-08-05 |
| 6596236 | Micro-machined thin film sensor arrays for the detection of H2 containing gases, and method of making and using the same | Frank Dimeo, Jr. | 2003-07-22 |
| 6589329 | Composition and process for production of copper circuitry in microelectronic device structures | Chongying Xu | 2003-07-08 |
| 6559328 | Indium source reagent compositions, and use thereof for deposition of indium-containing films on substrates and ion implantation of indium-doped shallow junction microelectronic structures | Chongying Xu | 2003-05-06 |
| 6527819 | Polishing slurries for copper and associated materials | William A. Wojtczak, Long Nguyen, Cary Regulski | 2003-03-04 |
| 6511706 | MOCVD of SBT using tetrahydrofuran-based solvent system for precursor delivery | Bryan C. Hendrix, Debra A. Desrochers-Christos, Jeffrey F. Roeder, Witold Paw | 2003-01-28 |
| 6504015 | Tetrahydrofuran-adducted group II &bgr;-diketonate complexes as source reagents for chemical vapor deposition | Witold Paw | 2003-01-07 |
| 6500238 | Fluid storage and dispensing system | George R. Brandes, Michael A. Tischler | 2002-12-31 |
| 6500489 | Low temperature CVD processes for preparing ferroelectric films using Bi alcoxides | Frank Hintermaier, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Debra A. Desrochers | 2002-12-31 |
| 6458984 | Chemical method for removal and analysis of boron impurities in tetraethylorthosilicate (TEOS) | Chongying Xu, Frank R. Hedges, David Bernhard, Brian L. Benac, Scott L. Battle +1 more | 2002-10-01 |
| 6444264 | Method for liquid delivery CVD utilizing alkane and polyamine solvent compositions | Frank Hintermaier | 2002-09-03 |
| 6440202 | Pyrazolate copper complexes, and MOCVD of copper using same | Chongying Xu, Ziyun Wang | 2002-08-27 |
| 6417369 | Pyrazolate copper complexes, and MOCVD of copper using same | Chongying Xu, Ziyun Wang | 2002-07-09 |
| 6409781 | Polishing slurries for copper and associated materials | William A. Wojtczak, Long Nguyen, Cary Regulski | 2002-06-25 |
| 6399208 | Source reagent composition and method for chemical vapor deposition formation or ZR/HF silicate gate dielectric thin films | Witold Paw | 2002-06-04 |
| 6379748 | Tantalum amide precursors for deposition of tantalum nitride on a substrate | Gautam Bhandari | 2002-04-30 |
| 6350643 | Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom | Frank Hintermaier, Jeffrey F. Roeder, Bryan C. Hendrix, Debra A. Desrochers | 2002-02-26 |
| 6346741 | Compositions and structures for chemical mechanical polishing of FeRAM capacitors and method of fabricating FeRAM capacitors using same | Peter C. Van Buskirk, Michael W. Russell, Steven M. Bilodeau | 2002-02-12 |
| 6344079 | Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition | — | 2002-02-05 |
| 6340769 | Method of fabricating iridium-based materials and structures on substrates, and iridium source reagents therefor | Chongying Xu | 2002-01-22 |
| 6340386 | MOCVD of SBT using toluene based solvent system for precursor delivery | Bryan C. Hendrix, Debra Desrochers Christos, Jeffrey F. Roeder | 2002-01-22 |
| 6338873 | Method of forming Group II metal-containing films utilizing Group II MOCVD source reagents | Witold Paw | 2002-01-15 |
| 6337148 | Copper source reagent compositions, and method of making and using same for microelectronic device structures | Chongying Xu | 2002-01-08 |
| 6331211 | Method and apparatus for forming low dielectric constant polymeric films | Chongying Xu, Ralph Carl, Edward A. Sturm | 2001-12-18 |