Issued Patents All Time
Showing 1–25 of 33 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7122856 | Capacitor having a barrier layer made of a transition metal phosphide, arsenide or sulfide | — | 2006-10-17 |
| 7005303 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix +2 more | 2006-02-28 |
| 6790676 | Method for producing a ferroelectric layer | Hans Cerva, Walter Hartner, Joachim Hoepfner, Guenther Schindler, Volker Weinrich +1 more | 2004-09-14 |
| 6787186 | Method of controlled chemical vapor deposition of a metal oxide ceramic layer | — | 2004-09-07 |
| 6730523 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix +2 more | 2004-05-04 |
| 6730562 | Method of patterning ferroelectric layers | Manfred Engelhardt, Walter Hartner, Gunther Schindler, Volker Weinrich | 2004-05-04 |
| 6713797 | Textured Bi-based oxide ceramic films | Debra A. Desrochers, Bryan C. Hendrix, Jeffrey F. Roeder | 2004-03-30 |
| 6693318 | Reduced diffusion of a mobile specie from a metal oxide ceramic | — | 2004-02-17 |
| 6669857 | Process for etching bismuth-containing oxide films | — | 2003-12-30 |
| 6605505 | Process for producing an integrated semiconductor memory configuration | Carlos Mazure-Espejo | 2003-08-12 |
| 6586348 | Method for preventing etching-induced damage to a metal oxide film by patterning the film after a nucleation anneal but while still amorphous and then thermally annealing to crystallize | Walter Hartner, Gunther Schindler, Volker Weinrich | 2003-07-01 |
| 6527848 | Complex of an element of transition group IV or V for forming an improved precursor combination | Ralf Metzger, Christoph Werner | 2003-03-04 |
| 6500489 | Low temperature CVD processes for preparing ferroelectric films using Bi alcoxides | Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum, Debra A. Desrochers | 2002-12-31 |
| 6495415 | Method for fabricating a patterned layer | Walter Hartner, Igor Kasko, Volker Weinrich, Gunther Schindler, Hermann Wendt | 2002-12-17 |
| 6444264 | Method for liquid delivery CVD utilizing alkane and polyamine solvent compositions | Thomas H. Baum | 2002-09-03 |
| 6438019 | Ferroelectric random access memory (FeRAM) having storage capacitors with different coercive voltages | Walter Hartner, Gunther Schindler | 2002-08-20 |
| 6350643 | Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom | Jeffrey F. Roeder, Bryan C. Hendrix, Debra A. Desrochers, Thomas H. Baum | 2002-02-26 |
| 6316802 | Easy to manufacture integrated semiconductor memory configuration with platinum electrodes | Gunther Schindler, Walter Hartner, Carlos Mazure-Espejo, Rainer Bruchhaus, Wolfgang Hönlein +1 more | 2001-11-13 |
| 6303391 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic films useful in ferroelectric memory devices | Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix +2 more | 2001-10-16 |
| 6297526 | Process for producing barrier-free semiconductor memory configurations | Carlos Mazure-Espejo | 2001-10-02 |
| 6258153 | Device for the deposition of substances | — | 2001-07-10 |
| 6214105 | Alkane and polyamine solvent compositions for liquid delivery chemical vapor deposition | Thomas H. Baum | 2001-04-10 |
| 6204158 | Reduced diffusion of a mobile specie from a metal oxide ceramic into the substrate | Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum, Debra A. Desrochers | 2001-03-20 |
| 6180420 | Low temperature CVD processes for preparing ferroelectric films using Bi carboxylates | Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum, Debra A. Desrochers | 2001-01-30 |
| 6177135 | Low temperature CVD processes for preparing ferroelectric films using Bi amides | Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum, Debra A. Desrochers | 2001-01-23 |