Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7005303 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2006-02-28 |
| 6730523 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2004-05-04 |
| 6713797 | Textured Bi-based oxide ceramic films | Bryan C. Hendrix, Jeffrey F. Roeder, Frank Hintermaier | 2004-03-30 |
| 6500489 | Low temperature CVD processes for preparing ferroelectric films using Bi alcoxides | Frank Hintermaier, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum | 2002-12-31 |
| 6350643 | Reduced degradation of metal oxide ceramic due to diffusion of a mobile specie therefrom | Frank Hintermaier, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum | 2002-02-26 |
| 6303391 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2001-10-16 |
| 6204158 | Reduced diffusion of a mobile specie from a metal oxide ceramic into the substrate | Bryan C. Hendrix, Frank Hintermaier, Jeffrey F. Roeder, Thomas H. Baum | 2001-03-20 |
| 6180420 | Low temperature CVD processes for preparing ferroelectric films using Bi carboxylates | Frank Hintermaier, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum | 2001-01-30 |
| 6177135 | Low temperature CVD processes for preparing ferroelectric films using Bi amides | Frank Hintermaier, Peter C. Van Buskirk, Jeffrey F. Roeder, Bryan C. Hendrix, Thomas H. Baum | 2001-01-23 |
| 6133051 | Amorphously deposited metal oxide ceramic films | Frank Hintermaier, Bryan C. Hendrix, Jeffrey F. Roeder, Thomas H. Baum | 2000-10-17 |