Issued Patents All Time
Showing 151–175 of 256 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7005303 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2006-02-28 |
| 7005392 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2006-02-28 |
| 6989457 | Chemical vapor deposition precursors for deposition of tantalum-based materials | Smuruthi Kamepalli | 2006-01-24 |
| 6989358 | Supercritical carbon dioxide/chemical formulation for removal of photoresists | Michael B. Korzenski, Eliodor G. Ghenciu, Chongying Xu | 2006-01-24 |
| 6984417 | Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film material | Peter C. Van Buskirk, Jeffrey F. Roeder, Steven M. Bilodeau, Michael W. Russell, Stephen T. Johnston +1 more | 2006-01-10 |
| 6960675 | Tantalum amide complexes for depositing tantalum-containing films, and method of making same | Tianniu Chen, Chongying Xu | 2005-11-01 |
| 6943139 | Removal of particle contamination on patterned silicon/silicon dioxide using supercritical carbon dioxide/chemical formulations | Michael B. Korzenski, Eliodor G. Ghenciu, Chongying Xu | 2005-09-13 |
| 6936542 | Polishing slurries for copper and associated materials | William A. Wojtczak, Long Nguyen, Cary Regulski | 2005-08-30 |
| 6909839 | Delivery systems for efficient vaporization of precursor source material | Luping Wang, Chongying Xu | 2005-06-21 |
| 6869638 | Source reagent compositions for CVD formation of gate dielectric thin films using amide precursors and method of using same | Chongying Xu, Bryan C. Hendrix, Jeffrey F. Roeder | 2005-03-22 |
| 6849200 | Composition and process for wet stripping removal of sacrificial anti-reflective material | David Bernhard, David W. Minsek, Melissa Murphy | 2005-02-01 |
| 6846424 | Plasma-assisted dry etching of noble metal-based materials | Phillip Chen, Frank Dimeo, Jr., Peter C. Van Buskirk, Peter S. Kirlin | 2005-01-25 |
| 6822107 | Chemical vapor deposition precursors for deposition of copper | Gautam Bhandari, Chongying Xu | 2004-11-23 |
| 6800218 | Abrasive free formulations for chemical mechanical polishing of copper and associated materials and method of using same | Ying Ma, Michael Jones, Deepak Verma, David Bernhard | 2004-10-05 |
| 6773873 | pH buffered compositions useful for cleaning residue from semiconductor substrates | Ma. Fatima Seijo, William A. Wojtczak, David Bernhard, David W. Minsek | 2004-08-10 |
| 6767830 | Br2SbCH3 a solid source ion implant and CVD precursor | Ziyun Wang, Chongying Xu, Michael A. Todd, Niamh McMahon | 2004-07-27 |
| 6740586 | Vapor delivery system for solid precursors and method of using same | Luping Wang, Chongying Xu | 2004-05-25 |
| 6735978 | Treatment of supercritical fluid utilized in semiconductor manufacturing applications | Glenn M. Tom, Michael B. Korzenski, Eliodor G. Ghenciu, Chongying Xu | 2004-05-18 |
| 6736993 | Silicon reagents and low temperature CVD method of forming silicon-containing gate dielectric materials using same | Chongying Xu, Bryan C. Hendrix | 2004-05-18 |
| 6730523 | Low temperature chemical vapor deposition process for forming bismuth-containing ceramic thin films useful in ferroelectric memory devices | Frank Hintermaier, Christine Dehm, Wolfgang Hoenlein, Peter C. Van Buskirk, Jeffrey F. Roeder +2 more | 2004-05-04 |
| 6709610 | Isotropic dry cleaning process for noble metal integrated circuit structures | Peter C. Van Buskirk, Frank Dimeo, Jr., Peter S. Kirlin | 2004-03-23 |
| 6692569 | A-SITE-AND/OR B-SITE-MODIFIED PBZRTIO3 MATERIALS AND (PB, SR, CA, BA, MG) (ZR, TI,NB, TA)O3 FILMS HAVING UTILITY IN FERROELECTRIC RANDOM ACCESS MEMORIES AND HIGH PERFORMANCE THIN FILM MICROACTUATORS | Jeffrey F. Roeder, Ing-Shin Chen, Steven M. Bilodeau | 2004-02-17 |
| 6692546 | Chemical mechanical polishing compositions for metal and associated materials and method of using same | Ying Ma, William A. Wojtczak, Cary Regulski, David Bernhard, Deepak Verma | 2004-02-17 |
| 6660331 | MOCVD of SBT using toluene-based solvent system for precursor delivery | Bryan C. Hendrix, Debra Desrochers Christos, Jeffrey F. Roeder | 2003-12-09 |
| 6639080 | Pyrazolate copper complexes, and MOCVD of copper using same | Chongying Xu, Ziyun Wang | 2003-10-28 |