Issued Patents All Time
Showing 1–25 of 36 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8299286 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition | Robin A. Gardiner, Thomas H. Baum, Douglas Gordon, Timothy E. Glassman, Sofia Pombrik +1 more | 2012-10-30 |
| 7323581 | Source reagent compositions and method for forming metal films on a substrate by chemical vapor deposition | Robin A. Gardiner, Thomas H. Baum, Timothy E. Glassman, Sophia Pombrik, Brian A. Vaastra +1 more | 2008-01-29 |
| 6846424 | Plasma-assisted dry etching of noble metal-based materials | Thomas H. Baum, Phillip Chen, Frank Dimeo, Jr., Peter C. Van Buskirk | 2005-01-25 |
| 6709610 | Isotropic dry cleaning process for noble metal integrated circuit structures | Peter C. Van Buskirk, Frank Dimeo, Jr., Thomas H. Baum | 2004-03-23 |
| 6320213 | Diffusion barriers between noble metal electrodes and metallization layers, and integrated circuit and semiconductor devices comprising same | Scott R. Summerfelt, Paul McIntryre | 2001-11-20 |
| 6204180 | Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery | Glenn M. Tom, James V. McManus | 2001-03-20 |
| 6162712 | Platinum source compositions for chemical vapor deposition of platinum | Thomas H. Baum, Sofia Pombrik | 2000-12-19 |
| 6132492 | Sorbent-based gas storage and delivery system for dispensing of high-purity gas, and apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing same | Steven J. Hultquist, Glenn M. Tom, James V. McManus | 2000-10-17 |
| 6126996 | Metal complex source reagents for chemical vapor deposition | Duncan W. Brown, Thomas W. Baum, Brian A. Vaarstra, Robin A. Gardiner | 2000-10-03 |
| 6110529 | Method of forming metal films on a substrate by chemical vapor deposition | Robin A. Gardiner, Thomas H. Baum, Douglas Gordon, Timothy E. Glassman, Sofia Pombrik +1 more | 2000-08-29 |
| 6072689 | Ferroelectric capacitor and integrated circuit device comprising same | — | 2000-06-06 |
| 6033919 | Method of forming sidewall capacitance structure | Bruce E. Gnade, Scott R. Summerfelt | 2000-03-07 |
| 6019823 | Sorbent-based fluid storage and dispensing vessel with replaceable sorbent cartridge members | Michael A. Tischler | 2000-02-01 |
| 5976928 | Chemical mechanical polishing of FeRAM capacitors | Peter C. Van Buskirk | 1999-11-02 |
| 5961697 | Bulk storage and dispensing system for fluids | James V. McManus, Dennis Brestovansky | 1999-10-05 |
| 5923970 | Method of fabricating a ferrolelectric capacitor with a graded barrier layer structure | — | 1999-07-13 |
| 5919522 | Growth of BaSrTiO.sub.3 using polyamine-based precursors | Thomas H. Baum, Gregory T. Stauf, Duncan W. Brown, Robin A. Gardiner, Gautam Bhandari +1 more | 1999-07-06 |
| 5840897 | Metal complex source reagents for chemical vapor deposition | Duncan W. Brown, Thomas H. Baum, Brian A. Vaarstra, Robin A. Gardiner | 1998-11-24 |
| 5820664 | Precursor compositions for chemical vapor deposition, and ligand exchange resistant metal-organic precursor solutions comprising same | Robin A. Gardiner, Thomas H. Baum, Douglas Gordon, Timothy E. Glassman, Sofia Pombrik +1 more | 1998-10-13 |
| 5783716 | Platinum source compositions for chemical vapor deposition of platinum | Thomas H. Baum, Sofia Pombrik | 1998-07-21 |
| 5711816 | Source reagent liquid delivery apparatus, and chemical vapor deposition system comprising same | Robin L. Binder, Robin A. Gardiner, Peter C. Van Buskirk, Gregory T. Stauf, Jiming Zhang | 1998-01-27 |
| 5705443 | Etching method for refractory materials | Gregory T. Stauf, Robin A. Gardiner, Peter C. Van Buskirk | 1998-01-06 |
| 5679815 | Tantalum and niobium reagents useful in chemical vapor deposition processes, and process for depositing coatings using the same | Brian A. Vaartstra, Douglas Gordon, Timothy E. Glassman | 1997-10-21 |
| 5677002 | Chemical vapor deposition of tantalum- or niobium-containing coatings | Brian A. Vaartstra, Douglas Gordon, Timothy E. Glassman | 1997-10-14 |
| 5581436 | High-dielectric-constant material electrodes comprising thin platinum layers | Scott R. Summerfelt, Howard R. Beratan, Bruce E. Gnade | 1996-12-03 |