Issued Patents All Time
Showing 26–50 of 50 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8017303 | Ultra low post exposure bake photoresist materials | Dario L. Goldfarb, Pushkara R. Varanasi | 2011-09-13 |
| 7862860 | Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallization | Tricia Breen Carmichael, Sarah J. Vella, Ali Afzali-Ardakani | 2011-01-04 |
| 7608390 | Top antireflective coating composition containing hydrophobic and acidic groups | Wu-Song Huang, Margaret C. Lawson, Kaushal S. Patel, Irene Popova, Pushkara R. Varanasi | 2009-10-27 |
| 7563563 | Wet developable bottom antireflective coating composition and method for use thereof | Kuang-Jung Chen, Ranee W. Kwong, Margaret C. Lawson, Wenjie Li, Kaushal S. Patel +1 more | 2009-07-21 |
| 7439302 | Low refractive index polymers as underlayers for silicon-containing photoresists | Wu-Song Huang, Sean D. Burns | 2008-10-21 |
| 7326523 | Low refractive index polymers as underlayers for silicon-containing photoresists | Wu-Song Huang, Sean D. Burns | 2008-02-05 |
| 7217496 | Fluorinated photoresist materials with improved etch resistant properties | Pushkara R. Varanasi, Wenjie Li, Kuang-Jung Chen, Kaushal S. Patel | 2007-05-15 |
| 7183036 | Low activation energy positive resist | Kuang-Jung Chen, Pushkara R. Varanasi | 2007-02-27 |
| 7141692 | Molecular photoresists containing nonpolymeric silsesquioxanes | Robert David Allen, Wu-Song Huang, Qinghuang Lin, Dirk Pfeiffer, Ratnam Sooriyakumaran +1 more | 2006-11-28 |
| 7129016 | Positive resist containing naphthol functionality | Kuang-Jung Chen, Pushkara R. Varanasi | 2006-10-31 |
| 7087267 | Materials and methods for immobilization of catalysts on surfaces and for selective electroless metallization | Tricia Breen, Sarah J. Vella, Ali Afzali-Ardakani | 2006-08-08 |
| 6927015 | Underlayer compositions for multilayer lithographic processes | Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more | 2005-08-09 |
| 6818381 | Underlayer compositions for multilayer lithographic processes | Timothy Hughes, Ranee W. Kwong, Pushkara R. Varanasi, William R. Brunsvold, Margaret C. Lawson +4 more | 2004-11-16 |
| 6770419 | Low silicon-outgassing resist for bilayer lithography | Ranee W. Kwong, Kuang-Jung Chen, Pushkara R. Varanasi, Robert David Allen, Phillip Brock +2 more | 2004-08-03 |
| 6303263 | Irradiation sensitive positive-tone resists using polymers containing two acid sensitive protecting groups | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Qinghuang Lin | 2001-10-16 |
| 6268436 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Quighuang Lin | 2001-07-31 |
| 6265134 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Ahmad D. Katnani, Ranee W. Kwong | 2001-07-24 |
| 6140015 | Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching | Pushkara R. Varanasi, Ahmad D. Katnani, Ranee W. Kwong | 2000-10-31 |
| 6103447 | Approach to formulating irradiation sensitive positive resists | Kuang-Jung Chen, Ronald A. DellaGuardia, Wu-Song Huang, Ahmad D. Katnani, Qinghuang Lin | 2000-08-15 |
| 5919597 | Methods for preparing photoresist compositions | Roger F. Sinta, Uday Kumar, George W. Orsula, James I. T. Fahey, William R. Brunsvold +3 more | 1999-07-06 |
| 5667938 | Acid scavengers for use in chemically amplified photoresists | Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani +2 more | 1997-09-16 |
| 5609989 | Acid scavengers for use in chemically amplified photoresists | Nageshwer Rao Bantu, William R. Brunsvold, George J. Hefferon, Wu-Song Huang, Ahmad D. Katnani +2 more | 1997-03-11 |
| RE34524 | Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines | Richard D. Diller, deceased, Anthony F. Arnold, Ying-Ying Cheng, Patricia Metzger Cotts, Donald C. Hofer +3 more | 1994-01-25 |
| 4849501 | Polyimide coating compositions based on meta-dialkyldihydrogen pyromellitate and aromatic diamines | Richard D. Diller, deceased, Anthony F. Arnold, Ying-Ying Cheng, Patricia Metzger Cotts, Donald C. Hofer +3 more | 1989-07-18 |
| 4665006 | Positive resist system having high resistance to oxygen reactive ion etching | Krishna G. Sachdev, Ranee W. Kwong, Harbans S. Sachdev | 1987-05-12 |