Issued Patents All Time
Showing 1–16 of 16 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7511206 | Carbon nanotubes and method of manufacturing same, electron emission source, and display | Yosuke SHIRATORI, Masahide Yamamoto, Shigeo Itoh, Kenji Nawamaki | 2009-03-31 |
| 6312769 | Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the same | Yasumasa Takeuchi, Shin Kimura, Yasuo Matsuki, Toshihiro Ogawa, Masayuki Kimura | 2001-11-06 |
| 5684065 | Surface-modified fluorine-containing resin molded article | Shinji Tamaru, Osamu Tanaka | 1997-11-04 |
| 5368681 | Method for the deposition of diamond on a substrate | Stefan Lätsch, Rong Xiao | 1994-11-29 |
| 5270151 | Spin on oxygen reactive ion etch barrier | Peter A. Agostino, Ajay P. Giri, Carlton G. Willson, Daniel J. Dawson | 1993-12-14 |
| 4999280 | Spray silylation of photoresist images | — | 1991-03-12 |
| 4875124 | Thin film magnetic heads with thermally crosslinked insulation | Heidi L. Dickstein, James H. Lee | 1989-10-17 |
| 4770974 | Microlithographic resist containing poly(1,1-dialkylsilazane) | — | 1988-09-13 |
| 4690838 | Process for enhancing the resistance of a resist image to reactive ion etching and to thermal flow | Jeffrey W. Labadie, James H. Lee, Scott A. MacDonald, Carlton G. Willson | 1987-09-01 |
| 4507331 | Dry process for forming positive tone micro patterns | — | 1985-03-26 |
| 4482427 | Process for forming via holes having sloped walls | — | 1984-11-13 |
| 4464460 | Process for making an imaged oxygen-reactive ion etch barrier | Donald C. Hofer, Robert D. Miller, Lester A. Pederson, Carlton G. Willson | 1984-08-07 |
| 4460436 | Deposition of polymer films by means of ion beams | — | 1984-07-17 |
| 4452665 | Polymeric halocarbons as plasma etch barriers | — | 1984-06-05 |
| 4389482 | Process for forming photoresists with strong resistance to reactive ion etching and high sensitivity to mid- and deep UV-light | Joachim Bargon, Lawrence W. Welsh, Jr. | 1983-06-21 |
| 4379826 | Positive electron beam resists of ortho chloro substituted phenol or cresol condensed with formaldehyde | James Economy, Roy J. Gritter | 1983-04-12 |