| 5370974 |
Laser exposure of photosensitive polyimide for pattern formation |
Ajay P. Giri, John R. Lankard, Sr., Ron McDonald |
1994-12-06 |
| 5277725 |
Process for fabricating a low dielectric composite substrate |
John Acocella, Arnold I. Baise, Richard A. Bates, Ray M. Bryant, Jon A. Casey +21 more |
1994-01-11 |
| 5270151 |
Spin on oxygen reactive ion etch barrier |
Ajay P. Giri, Hiroyuki Hiraoka, Carlton G. Willson, Daniel J. Dawson |
1993-12-14 |
| 5262273 |
Photosensitive reactive ion etch barrier |
Frederick M. Pressman |
1993-11-16 |
| 5215861 |
Thermographic reversible photoresist |
Adolph Herbst, Frederick M. Pressman |
1993-06-01 |
| 5135595 |
Process for fabricating a low dielectric composite substrate |
John Acocella, Arnold I. Baise, Richard A. Bates, Ray M. Bryant, Jon A. Casey +21 more |
1992-08-04 |
| 4735820 |
Removal of residual catalyst from a dielectric substrate |
Suryadevara V. Babu, Joseph G. Hoffarth |
1988-04-05 |
