YM

Yasuo Matsuki

JS Jsr: 22 patents #21 of 1,137Top 2%
JR Japan Synthetic Rubber: 7 patents #32 of 558Top 6%
JA Japan Science And Technology Agency: 5 patents #92 of 2,171Top 5%
SE Seiko Epson: 4 patents #3,385 of 7,774Top 45%
HS Hitachi High-Tech Science: 1 patents #94 of 167Top 60%
IR International Center For Materials Research: 1 patents #5 of 14Top 40%
Sharp Kabushiki Kaisha: 1 patents #6,861 of 10,731Top 65%
Overall (All Time): #103,144 of 4,157,543Top 3%
34
Patents All Time

Issued Patents All Time

Showing 25 most recent of 34 patents

Patent #TitleCo-InventorsDate
10199651 Binder composition for electrode of electric storage device Osamu Kose, Tomotaka Shinoda 2019-02-05
9653306 Method for forming crystalline cobalt silicide film Tatsuya Shimoda, Ryo Kawajiri 2017-05-16
9435032 Method for forming patterned conductive film Tatsuya Shimoda, Zhongrong Shen 2016-09-06
9257273 Charged particle beam apparatus, thin film forming method, defect correction method and device forming method Yoshihiro Koyama, Anto Yasaka, Tatsuya Shimoda, Ryo Kawajiri 2016-02-09
9126849 Container containing a cobalt carbonyl complex and cobalt carbonyl complex composition Hideki Nishimura, Kouji Sumiya 2015-09-08
8828555 Method for forming patterned conductive film Tatsuya Shimoda, Zhongrong Shen 2014-09-09
8673682 High order silane composition and method of manufacturing a film-coated substrate Tatsuya Shimoda, Takashi Masuda 2014-03-18
8597424 Composition and method for forming an aluminum film Tatsuya Sakai, Tetsuo Tominaga 2013-12-03
7776766 Trench filling method Tatsuya Sakai 2010-08-17
7718228 Composition for forming silicon-cobalt film, silicon-cobalt film and method for forming same Daohai Wang, Tatsuya Sakai, Haruo Iwasawa 2010-05-18
7473443 Composition for forming silicon film and method for forming silicon film Haruo Iwasawa, Hitoshi Kato 2009-01-06
7238822 Ruthenium compound and process for producing a metal ruthenium film Tatsuya Sakai, Sachiko Hashimoto 2007-07-03
7223802 High order silane composition, and method of forming silicon film using the composition Takashi Aoki, Masahiro Furusawa, Haruo Iwasawa, Yasumasa Kateuchi 2007-05-29
7002033 Chemical vapor deposition material and chemical vapor deposition Tatsuya Sakai, Sachiko Hashimoto 2006-02-21
6953600 Conductive film forming composition, conductive film, and method for forming the same Yasuaki Yokoyama, Ikuo Sakono, Kazuki Kobayashi, Yasumasa Takeuchi 2005-10-11
6875518 Ruthenium film, ruthenium oxide film and process for forming the same Hiroshi Shiho, Hitoshi Kato, Satoshi Ebata, Yoichiro Maruyama, Yasuaki Yokoyama 2005-04-05
6846513 Method for fabricating a silicon thin-film Masahiro Furusawa, Satoru Miyashita, Ichio Yudasaka, Tatsuya Shimoda, Yasuaki Yokoyama +1 more 2005-01-25
6806210 Tantalum oxide film, use thereof, process for forming the same and composition Hiroshi Shiho, Hitoshi Kato, Sachiko Hashimoto, Isamu Yonekura 2004-10-19
6541354 Method for forming silicon film Tatsuya Shimoda, Satoru Miyashita, Shunichi Seki, Masahiro Furusawa, Ichio Yudasaka +1 more 2003-04-01
6527847 Coating composition 2003-03-04
6517911 Process for the formation of silicon oxide films 2003-02-11
6518087 Method for manufacturing solar battery Masahiro Furusawa, Shunichi Seki, Satoru Miyashita, Tatsuya Shimoda, Ichio Yudasaka +1 more 2003-02-11
6503570 Cyclosilane compound, and solution composition and process for forming a silicon film Satoshi Ebata 2003-01-07
6312769 Liquid crystal alignment layer, production method for the same, and liquid crystal display device comprising the same Hiroyuki Hiraoka, Yasumasa Takeuchi, Shin Kimura, Toshihiro Ogawa, Masayuki Kimura 2001-11-06
6224788 Liquid crystal aligning agent and process for producing liquid crystal alignment film using the same Toshihiro Ogawa, Shoichi Nakata, Yutaka Makita, Masayuki Kimura, Yasumasa Takeuchi +1 more 2001-05-01