Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10529531 | Ion source and electron source having single-atom termination structure, tip having single-atom termination structure, gas field ion source, focused ion beam apparatus, electron source, electron microscope, mask repair apparatus, and method of manufacturing tip having single-atom termination structure | Chuhei Oshima, Masahiko Tomitori, Tatsuya Shimoda | 2020-01-07 |
| 10276343 | Method for acquiring image and ion beam apparatus | Tomokazu Kozakai, Fumio Aramaki, Osamu Matsuda, Kensuke SHIINA, Kazuo Aita | 2019-04-30 |
| 10014157 | Method for acquiring image and ion beam apparatus | Tomokazu Kozakai, Fumio Aramaki, Osamu Matsuda, Kensuke SHIINA, Kazuo Aita | 2018-07-03 |
| 9793085 | Focused ion beam apparatus | Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki +1 more | 2017-10-17 |
| 9773634 | Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus | Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki +1 more | 2017-09-26 |
| 9640361 | Emitter structure, gas ion source and focused ion beam system | Yasuhiko Sugiyama, Hiroshi Oba | 2017-05-02 |
| 9583299 | Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus | Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki +1 more | 2017-02-28 |
| 9378858 | Repair apparatus | Fumio Aramaki, Osamu Matsuda, Yasuhiko Sugiyama, Hiroshi Oba, Tomokazu Kozakai +1 more | 2016-06-28 |
| 9336979 | Focused ion beam apparatus with precious metal emitter surface | Fumio Aramaki, Yasuhiko Sugiyama, Tomokazu Kozakai, Osamu Matsuda | 2016-05-10 |
| 9257273 | Charged particle beam apparatus, thin film forming method, defect correction method and device forming method | Yoshihiro Koyama, Tatsuya Shimoda, Yasuo Matsuki, Ryo Kawajiri | 2016-02-09 |
| 9129771 | Emitter structure, gas ion source and focused ion beam system | Yasuhiko Sugiyama, Hiroshi Oba | 2015-09-08 |
| 8999178 | Method for fabricating emitter | Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda | 2015-04-07 |
| 8963100 | Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa | Fumio Aramaki, Yasuhiko Sugiyama, Tomokazu Kozakai, Osamu Matsuda | 2015-02-24 |
| 8764994 | Method for fabricating emitter | Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda | 2014-07-01 |
| 8460842 | Defect repair apparatus and method for EUV mask using a hydrogen ion beam | Takashi Ogawa, Hiroshi Oba, Fumio Aramaki | 2013-06-11 |
| 7172839 | Photomask correction method using composite charged particle beam, and device used in the correction method | Yasuhiko Sugiyama, Junichi Tashiro | 2007-02-06 |
| 5153440 | Method of stabilizing operation for a liquid metal ion source | — | 1992-10-06 |
| 4902530 | Method of correcting a pattern film | Yoshitomo Nakagawa, Mitsuyoshi Sato | 1990-02-20 |