Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11081312 | Method of manufacturing emitter, emitter, and focused ion beam apparatus | Yoshimi Kawanami, Hiroyuki Mutoh, Yoko Nakajima, Hironori Moritani, Shinichi Matsubara | 2021-08-03 |
| 10276343 | Method for acquiring image and ion beam apparatus | Fumio Aramaki, Osamu Matsuda, Kensuke SHIINA, Kazuo Aita, Anto Yasaka | 2019-04-30 |
| 10014157 | Method for acquiring image and ion beam apparatus | Fumio Aramaki, Osamu Matsuda, Kensuke SHIINA, Kazuo Aita, Anto Yasaka | 2018-07-03 |
| 9793085 | Focused ion beam apparatus | Anto Yasaka, Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki +1 more | 2017-10-17 |
| 9793092 | Charged particle beam apparatus and processing method | Masashi Muramatsu, Fumio Aramaki | 2017-10-17 |
| 9773634 | Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus | Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Anto Yasaka +1 more | 2017-09-26 |
| 9583299 | Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus | Osamu Matsuda, Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Anto Yasaka +1 more | 2017-02-28 |
| 9378858 | Repair apparatus | Fumio Aramaki, Anto Yasaka, Osamu Matsuda, Yasuhiko Sugiyama, Hiroshi Oba +1 more | 2016-06-28 |
| 9336979 | Focused ion beam apparatus with precious metal emitter surface | Anto Yasaka, Fumio Aramaki, Yasuhiko Sugiyama, Osamu Matsuda | 2016-05-10 |
| 9245712 | Focused ion beam system | Yasuhiko Sugiyama, Osamu Matsuda | 2016-01-26 |
| 8999178 | Method for fabricating emitter | Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Osamu Matsuda, Anto Yasaka | 2015-04-07 |
| 8963100 | Nitrogen ions from a gas field ion source held at a pressure of 1.0 x 10^(-6) pa to 1.0 x 10^(-2) pa | Anto Yasaka, Fumio Aramaki, Yasuhiko Sugiyama, Osamu Matsuda | 2015-02-24 |
| 8890093 | Charged particle beam apparatus and method for forming observation image | Fumio Aramaki, Osamu Matsuda | 2014-11-18 |
| 8764994 | Method for fabricating emitter | Yasuhiko Sugiyama, Kazuo Aita, Fumio Aramaki, Osamu Matsuda, Anto Yasaka | 2014-07-01 |
| 7927769 | Method for fabricating EUVL mask | Ryoji Hagiwara, Osamu Takaoka | 2011-04-19 |
| 7750318 | Working method by focused ion beam and focused ion beam working apparatus | — | 2010-07-06 |
| 7576340 | Focused ion beam processing method | Ryoji Hagiwara, Yasuhiko Sugiyama | 2009-08-18 |
| 7488961 | Charged particle beam irradiation method and charged particle beam apparatus | Masashi Muramatsu, Ryoji Hagiwara | 2009-02-10 |
| 7485880 | Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method | Masashi Muramatsu, Ryoji Hagiwara | 2009-02-03 |
| 7323685 | Ion beam processing method | Kazuo Aita, Osamu Takaoka | 2008-01-29 |
| 6780551 | Charged particle processing for forming pattern boundaries at a uniform thickness | Ryoji Hagiwara | 2004-08-24 |