Issued Patents All Time
Showing 1–22 of 22 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8815474 | Photomask defect correcting method and device | — | 2014-08-26 |
| 8257887 | Photomask defect correcting method and device | — | 2012-09-04 |
| 8062494 | Micro-machining dust removing device, micro-machining apparatus, and micro-machining dust removing method | Futoshi Iwata, Masatoshi Yasutake, Takuya Nakaue, Syuichi Kikuchi | 2011-11-22 |
| 7927769 | Method for fabricating EUVL mask | Ryoji Hagiwara, Tomokazu Kozakai | 2011-04-19 |
| 7804067 | Method of observing and method of working diamond stylus for working of atomic force microscope | — | 2010-09-28 |
| 7571639 | Method of correcting opaque defect of photomask using atomic force microscope fine processing device | Toshio Doi, Kazutoshi Watanabe, Atsushi Uemoto | 2009-08-11 |
| 7442925 | Working method using scanning probe | Masatoshi Yasutake, Takuya Nakaue, Kazutoshi Watanabe, Atsushi Uemoto, Naoya Watanabe +1 more | 2008-10-28 |
| 7378654 | Processing probe | Shigeru Wakiyama, Masatoshi Yasutake | 2008-05-27 |
| 7375352 | Photomask defect correction method employing a combined device of a focused electron beam device and an atomic force microscope | Ryoji Hagiwara | 2008-05-20 |
| 7323685 | Ion beam processing method | Kazuo Aita, Tomokazu Kozakai | 2008-01-29 |
| 7285792 | Scratch repairing processing method and scanning probe microscope (SPM) used therefor | Naoya Watanabe | 2007-10-23 |
| 7278299 | Method of processing vertical cross-section using atomic force microscope | Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe | 2007-10-09 |
| 7259372 | Processing method using probe of scanning probe microscope | Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe | 2007-08-21 |
| 7232995 | Method of removing particle of photomask using atomic force microscope | Masatoshi Yasutake, Shigeru Wakiyama, Naoya Watanabe | 2007-06-19 |
| 7189655 | Method of correcting amplitude defect in multilayer film of EUVL mask | — | 2007-03-13 |
| 7107826 | Scanning probe device and processing method by scanning probe | Naoya Watanabe | 2006-09-19 |
| 7018683 | Electron beam processing method | Ryoji Hagiwara | 2006-03-28 |
| 6703626 | Mask defect repair method | Satoru Yabe | 2004-03-09 |
| 6544692 | Black defect correction method and black defect correction device for photomask | Kazuo Aita | 2003-04-08 |
| 6467426 | Photomask correction device | Kazuo Aita | 2002-10-22 |
| 6335530 | Objective lens for scanning electron microscope | Akira Yonezawa | 2002-01-01 |
| 6037589 | Electron beam device | Akira Yonezawa, Mitsuyoshi Sato | 2000-03-14 |