Issued Patents All Time
Showing 1–25 of 86 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11592287 | Method for measuring distance of diffusion of curing catalyst | Tsutomu Ogihara, Tsukasa Watanabe, Tomohiro Kobayashi, Yusuke Biyajima, Masahiro Kanayama | 2023-02-28 |
| 11572442 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Kazuya Honda | 2023-02-07 |
| 11500285 | Multifunctional polymers | Luisa D. Bozano, Daisuke Domon, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders +3 more | 2022-11-15 |
| 11333975 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Katsuya Takemura, Masashi Iio, Kazuya Honda | 2022-05-17 |
| 10345700 | Negative-tone resist compositions and multifunctional polymers therein | Luisa D. Bozano, Daisuke Domon, Keiichi Masunaga, Martha I. Sanchez, Daniel P. Sanders +3 more | 2019-07-09 |
| 9709885 | Photomask blank and method for manufacturing photomask blank | Yukio Inazuki, Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Hideo Kaneko +1 more | 2017-07-18 |
| 9580623 | Patterning process using a boron phosphorus silicon glass film | Seiichiro Tachibana, Yoshinori Taneda, Rie Kikuchi, Tsutomu Ogihara, Karen E. Petrillo +1 more | 2017-02-28 |
| 9488906 | Photomask blank and method for manufacturing photomask blank | Yukio Inazuki, Takashi Yoshii, Toyohisa Sakurada, Akira Ikeda, Hideo Kaneko +1 more | 2016-11-08 |
| 9400422 | Method for manufacturing photomask blank | Takashi Yoshii, Yukio Inazuki, Satoshi Watanabe, Akira Ikeda, Toyohisa Sakurada +1 more | 2016-07-26 |
| 9244348 | Chemically amplified negative resist composition and pattern forming process | Keiichi Masunaga, Satoshi Watanabe, Luisa D. Bozano, Ratnam Sooriyakumaran | 2016-01-26 |
| 8858814 | Photomask blank, processing method, and etching method | Satoshi Watanabe, Hideo Kaneko, Ryuji Koitabashi, Shinichi Igarashi, Shozo Shirai | 2014-10-14 |
| 8741548 | Patterning process | Jun Hatakeyama, Takao Yoshihara, Katsuya Takemura | 2014-06-03 |
| 8703384 | Positive resist composition and patterning process | Tomohiro Kobayashi, Eiji Fukuda, Takayuki Nagasawa, Ryosuke Taniguchi, Youichi Ohsawa +1 more | 2014-04-22 |
| 8617800 | Patterning process | Jun Hatakeyama, Kazuhiro Katayama | 2013-12-31 |
| 8367310 | Pattern forming process and resist-modifying composition | Takeru Watanabe, Masashi Iio, Jun Hatakeyama, Tsunehiro Nishi | 2013-02-05 |
| 7741015 | Patterning process and resist composition | Jun Hatakeyama, Takao Yoshihara, Takeshi Kinsho, Koji Hasegawa, Katsuya Takemura | 2010-06-22 |
| 7666967 | Ester compound, polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2010-02-23 |
| 7569323 | Resist protective coating material and patterning process | Jun Hatakeyama, Yuji Harada, Masayuki Endo, Masaru Sasago, Haruhiko Komoriya +3 more | 2009-08-04 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2009-02-10 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Masaru Sasago, Masayuki Endo, Kazuhiko Maeda +2 more | 2008-05-27 |
| 7354693 | Polymer, resist protective coating material, and patterning process | Jun Hatakeyama, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani | 2008-04-08 |
| 7332616 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | Jun Hatakeyama, Yuji Harada | 2008-02-19 |
| 7276623 | Polymerizable ester compounds | Yuji Harada, Jun Hatakeyama, Kazuhiko Maeda, Haruhiko Komoriya, Michitaka Ootani | 2007-10-02 |
| 7241553 | Polymer, resist composition, and patterning process | Jun Hatakeyama, Yuji Harada, Masaru Sasago, Masayuki Endo, Shinji Kishimura +3 more | 2007-07-10 |
| 7232641 | Polymerizable compound, polymer, positive-resist composition, and patterning process using the same | Jun Hatakeyama, Yuji Harada | 2007-06-19 |