MK

Masahiro Kanayama

SC Shin-Etsu Chemical Co.: 7 patents #535 of 2,176Top 25%
NC Nihon Nohyaku Co.: 1 patents #153 of 243Top 65%
📍 Joetsu, JP: #94 of 239 inventorsTop 40%
Overall (All Time): #537,938 of 4,157,543Top 15%
9
Patents All Time

Issued Patents All Time

Showing 1–9 of 9 patents

Patent #TitleCo-InventorsDate
12332565 Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Ryo MITSUI 2025-06-17
12174541 Composition for forming silicon-containing resist underlayer film and patterning process Tsutomu Ogihara, Yusuke Biyajima 2024-12-24
12085857 Composition for forming silicon-containing resist underlayer film and patterning process Tsutomu Ogihara, Yusuke Biyajima 2024-09-10
11914295 Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning process Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima, Ryo MITSUI 2024-02-27
11592287 Method for measuring distance of diffusion of curing catalyst Tsutomu Ogihara, Tsukasa Watanabe, Yoshio Kawai, Tomohiro Kobayashi, Yusuke Biyajima 2023-02-28
11480879 Composition for forming silicon-containing resist underlayer film and patterning process Tsutomu Ogihara, Tsukasa Watanabe, Yusuke Biyajima 2022-10-25
11385544 Composition for forming silicon-containing resist underlayer film and patterning process Tsutomu Ogihara, Yusuke Biyajima, Tsukasa Watanabe, Masaki Ohashi 2022-07-12
6720288 Herbicidal compositions and method of using the same Tsutomu Mabuchi, Takashi Ohtsuka, Sumitaka Kose 2004-04-13
4581946 Instrumental error compensation circuit for flow meter 1986-04-15