Issued Patents All Time
Showing 1–25 of 90 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12351742 | Material for forming adhesive film, patterning process, and method for forming adhesive film | Mamoru WATABE, Takayoshi NAKAHARA, Yusuke Biyajima, Tsutomu Ogihara | 2025-07-08 |
| 12147160 | Resist underlayer film material, patterning process, and method for forming resist underlayer film | Daisuke KORI, Takayoshi NAKAHARA, Yusuke Biyajima | 2024-11-19 |
| 11142640 | Silicon-containing compound, urethane resin, stretchable film and method for forming the same | Jun Hatakeyama, Motoaki Iwabuchi, Shiori Nonaka, Koji Hasegawa | 2021-10-12 |
| 11066430 | Method for producing polyalkylene glycol derivative having amino group at end | Yuki Suka, Takeru Watanabe, Shiori Nonaka | 2021-07-20 |
| 10975042 | Method for purifying an amino acid-n-carboxy anhydride | Yuki Suka, Shiori Nonaka, Kazuomi Sato, Takeru Watanabe, Takehiko Ishii | 2021-04-13 |
| 10836861 | Methods of preparing and purifying polyalkylene glycol derivative | Shiori Nonaka, Yuki Suka | 2020-11-17 |
| 10717804 | Silicon-containing compound, urethane resin, stretchable film, and method for forming the same | Jun Hatakeyama, Shiori Nonaka, Ryo MITSUI, Osamu Watanabe | 2020-07-21 |
| 10696779 | Silicon-containing compound, urethane resin, stretchable film, and method for forming the same | Jun Hatakeyama, Shiori Nonaka, Ryo MITSUI, Osamu Watanabe | 2020-06-30 |
| 10550136 | Method for producing polyalkylene glycol derivative having amino group at end | Yuki Suka, Takeru Watanabe, Shiori Nonaka | 2020-02-04 |
| 10472377 | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator | Yuki Suka, Takeru Watanabe, Shiori Nonaka | 2019-11-12 |
| 10377775 | Method for producing polyalkylene glycol derivative having amino group at end | Yuki Suka, Takeru Watanabe, Shiori Nonaka | 2019-08-13 |
| 9708350 | Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator | Yuki Suka, Takeru Watanabe, Shiori Nonaka | 2017-07-18 |
| 9284408 | Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereof | Yuki Suka, Takeru Watanabe, Osamu Watanabe | 2016-03-15 |
| 9261783 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Takeshi Kinsho, Yuuki Suka, Koji Hasegawa, Takeshi Sasami | 2016-02-16 |
| 9187404 | Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distribution | Yuki Suka, Osamu Watanabe, Takeru Watanabe | 2015-11-17 |
| 9086628 | Resist protective film-forming composition and patterning process | Yuuki Suka, Koji Hasegawa | 2015-07-21 |
| 8945809 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | Koji Hasegawa, Masayoshi Sagehashi, Taku Morisawa, Takao Yoshihara | 2015-02-03 |
| 8933251 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Jun Hatakeyama +2 more | 2015-01-13 |
| 8916331 | Resist composition and patterning process | Koji Hasegawa, Takeshi Sasami, Taku Morisawa | 2014-12-23 |
| 8697903 | Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid | Takeshi Kinsho, Yuuki Suka, Koji Hasegawa, Takeshi Sasami | 2014-04-15 |
| 8431323 | Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process | Takeru Watanabe, Satoshi Shinachi, Takeshi Kinsho, Koji Hasegawa, Jun Hatakeyama +2 more | 2013-04-30 |
| 8420292 | Polymer, resist composition, and patterning process | Takeru Watanabe, Takeshi Sasami, Yuuki Suka, Koji Hasegawa | 2013-04-16 |
| 8361703 | Resist protective coating composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2013-01-29 |
| 8323872 | Resist protective coating material and patterning process | Jun Hatakeyama, Takeru Watanabe | 2012-12-04 |
| 8313886 | Resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa, Tomohiro Kobatashi | 2012-11-20 |