Issued Patents All Time
Showing 1–25 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12275693 | Onium salt, chemically amplified resist composition and patterning process | Takayuki Fujiwara, Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama | 2025-04-15 |
| 12032289 | Polymer, chemically amplified resist composition and patterning process | Masahiro Fukushima, Emiko Ono | 2024-07-09 |
| 12013639 | Positive resist material and patterning process | Jun Hatakeyama, Naoki Ishibashi | 2024-06-18 |
| 11662663 | Substrate protective film-forming composition and pattern forming process | Tomohiro Kobayashi, Kenichi Oikawa, Teppei Adachi | 2023-05-30 |
| 11579529 | Positive resist composition and patterning process | Yoshinori Matsui, Tatsushi Kaneko, Akihiro Seki, Satoshi Watanabe | 2023-02-14 |
| 11548844 | Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process | Daisuke Domon, Masaaki Kotake, Naoya Inoue, Keiichi Masunaga, Satoshi Watanabe | 2023-01-10 |
| 11492337 | Epoxy compound, resist composition, and pattern forming process | Ryosuke Taniguchi, Takeru Watanabe, Yoshinori Matsui | 2022-11-08 |
| 11435666 | Salt compound, chemically amplified resist composition, and patterning process | Emiko Ono, Masahiro Fukushima, Yuki Kera | 2022-09-06 |
| 11286320 | Polymerizable monomer, polymer compound for conductive polymer, and method for producing the polymer compound | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masahiro Fukushima | 2022-03-29 |
| 11009793 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama | 2021-05-18 |
| 10591819 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-03-17 |
| 10527939 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-01-07 |
| 10457779 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Koji Hasegawa | 2019-10-29 |
| 10363555 | Polymer compound for conductive polymer and method for producing the same | Jun Hatakeyama, Koji Hasegawa, Masaki Ohashi, Takayuki Nagasawa | 2019-07-30 |
| 10303056 | Resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2019-05-28 |
| 10216085 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masashi Iio, Koji Hasegawa | 2019-02-26 |
| 10131730 | Resist composition and patterning process | Takayuki Fujiwara, Koji Hasegawa, Kenichi Oikawa | 2018-11-20 |
| 10126649 | Resist composition and patterning process using the same | Jun Hatakeyama, Koji Hasegawa | 2018-11-13 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masahiro Fukushima, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 9927708 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama | 2018-03-27 |
| 9810983 | Polymer, chemically amplified positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2017-11-07 |
| 9790166 | Polymer, monomer, resist composition, and patterning process | Koji Hasegawa, Masahiro Fukushima, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9758609 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Kazuhiro Katayama, Jun Hatakeyama | 2017-09-12 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Masahiro Fukushima, Ryosuke Taniguchi | 2017-08-22 |
| 9709890 | Resist composition and patterning process | Jun Hatakeyama, Daisuke Domon, Koji Hasegawa | 2017-07-18 |