Issued Patents All Time
Showing 26–50 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9663593 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masaki Ohashi | 2017-05-30 |
| 9657115 | Polymer compound for a conductive polymer and method for manufacturing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa | 2017-05-23 |
| 9632415 | Pattern forming process and shrink agent | Jun Hatakeyama, Kazuhiro Katayama, Koji Hasegawa | 2017-04-25 |
| 9527937 | Polymer compound for a conductive polymer and method for producing same | Jun Hatakeyama, Koji Hasegawa, Takayuki Nagasawa, Masaki Ohashi | 2016-12-27 |
| 9458144 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi | 2016-10-04 |
| 9436093 | Pattern forming process and shrink agent | Jun Hatakeyama | 2016-09-06 |
| 9429846 | Pattern forming process and shrink agent | Jun Hatakeyama, Teppei Adachi | 2016-08-30 |
| 9366963 | Resist composition and pattern forming process | Jun Hatakeyama | 2016-06-14 |
| 9335633 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-05-10 |
| 9316915 | Negative resist composition and pattern forming process | Jun Hatakeyama | 2016-04-19 |
| 9285678 | Sulfonium salt, resist composition and resist pattern forming process | Daisuke Domon, Keiichi Masunaga, Satoshi Watanabe | 2016-03-15 |
| 9256127 | Monomer, polymer, resist composition, and patterning process | Takayuki Fujiwara, Koji Hasegawa, Ryosuke Taniguchi | 2016-02-09 |
| 9250517 | Polymer, positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-02-02 |
| 9250518 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi | 2016-02-02 |
| 9250522 | Positive resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2016-02-02 |
| 9244350 | Positive resist composition and patterning process | Jun Hatakeyama | 2016-01-26 |
| 9235122 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Kazuhiro Katayama | 2016-01-12 |
| 9213235 | Patterning process, resist composition, polymer, and monomer | Koji Hasegawa, Kazuhiro Katayama, Tomohiro Kobayashi | 2015-12-15 |
| 9207534 | Nitrogen-containing monomer, polymer, resist composition, and patterning process | Jun Hatakeyama, Takeru Watanabe, Tomohiro Kobayashi | 2015-12-08 |
| 9182668 | Patterning process, resist composition, polymer, and monomer | Koji Hasegawa, Tomohiro Kobayashi, Kazuhiro Katayama | 2015-11-10 |
| 9122155 | Sulfonium salt, resist composition and patterning process | Masaki Ohashi, Tomohiro Kobayashi, Akihiro Seki, Masahiro Fukushima | 2015-09-01 |
| 9115074 | Fluorinated monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Takeshi Sasami | 2015-08-25 |
| 9086624 | Monomer, polymer, resist composition, and patterning process | Jun Hatakeyama, Koji Hasegawa | 2015-07-21 |
| 9081290 | Patterning process and resist composition | Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama, Kentaro Kumaki, Tomohiro Kobayashi | 2015-07-14 |
| 9063413 | Resist composition, patterning process, monomer, and copolymer | Jun Hatakeyama | 2015-06-23 |