Issued Patents All Time
Showing 51–73 of 73 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9052593 | Resist composition and patterning process | Jun Hatakeyama | 2015-06-09 |
| 9046772 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Kazuhiro Katayama | 2015-06-02 |
| 9029064 | Patterning process and resist composition | Jun Hatakeyama, Takeru Watanabe, Kazuhiro Katayama | 2015-05-12 |
| 9017922 | Chemically amplified resist composition and patterning process | Jun Hatakeyama | 2015-04-28 |
| 9017931 | Patterning process and resist composition | Koji Hasegawa, Jun Hatakeyama, Teppei Adachi | 2015-04-28 |
| 8968979 | Positive resist composition and patterning process | Katsuya Takemura, Keiichi Masunaga, Daisuke Domon | 2015-03-03 |
| 8956803 | Sulfonium salt, resist composition, and patterning process | Masaki Ohashi, Tomohiro Kobayashi, Akihiro Seki, Masahiro Fukushima | 2015-02-17 |
| 8957160 | Preparation of polymer, resulting polymer, resist composition, and patterning process | Masaki Ohashi, Tomohiro Kobayashi | 2015-02-17 |
| 8945809 | Fluorinated monomer, fluorinated polymer, resist composition, and patterning process | Koji Hasegawa, Taku Morisawa, Yuji Harada, Takao Yoshihara | 2015-02-03 |
| 8921026 | Basic compound, chemically amplified resist composition, and patterning process | Jun Hatakeyama, Takeru Watanabe | 2014-12-30 |
| 8900793 | Polymer, chemically amplified resist composition, and patterning process using said chemically amplified resist composition | Youichi Ohsawa, Koji Hasegawa, Tomohiro Kobayashi | 2014-12-02 |
| 8900796 | Acid generator, chemically amplified resist composition, and patterning process | Masaki Ohashi, Tomohiro Kobayashi | 2014-12-02 |
| 8877424 | Monomer, polymer, resist composition, and patterning process | Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama | 2014-11-04 |
| 8808964 | Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process | Takeru Watanabe, Tomohiro Kobayashi | 2014-08-19 |
| 8795946 | Polymerizable ester compound, polymer, resist composition, and patterning process | Koji Hasegawa, Yuuki Suka, Masashi Ilo | 2014-08-05 |
| 8791288 | Acid-labile ester monomer having spirocyclic structure, polymer, resist composition, and patterning process | Takeshi Kinsho, Tomohiro Kobayashi, Takeru Watanabe, Koji Hasegawa, Seiichiro Tachibana | 2014-07-29 |
| 8703384 | Positive resist composition and patterning process | Tomohiro Kobayashi, Eiji Fukuda, Takayuki Nagasawa, Ryosuke Taniguchi, Youichi Ohsawa +1 more | 2014-04-22 |
| 8686166 | Preparation of 2,2-bis (fluoroalkyl) oxirane and preparation of photoacid generator therefrom | Takeru Watanabe, Youichi Ohsawa, Koji Hasegawa, Masaki Ohashi | 2014-04-01 |
| 8647808 | Fluorinated monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Takeshi Sasami | 2014-02-11 |
| 8628908 | Chemically amplified resist composition and patterning process | Takeru Watanabe, Tomohiro Kobayashi, Takeshi Nagata, Youichi Ohsawa, Ryosuke Taniguchi | 2014-01-14 |
| 8597869 | Sulfonium salt, resist composition, and patterning process | Youichi Ohsawa, Koji Hasegawa, Takeshi Kinsho, Tomohiro Kobayashi | 2013-12-03 |
| 8535869 | Sulfonium salt, resist composition, and patterning process | Youichi Ohsawa, Tomohiro Kobayashi | 2013-09-17 |
| 8420290 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | Koji Hasegawa, Masaki Ohashi, Takeshi Kinsho, Tsunehiro Nishi | 2013-04-16 |