Issued Patents All Time
Showing 1–25 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12360451 | Method of manufacturing semiconductor device | Chawon Koh, Hyunwoo KIM, Jinkyun LEE, Junil Kim, Hyuntaek Oh +2 more | 2025-07-15 |
| 12181799 | Resist compositions and semiconductor fabrication methods using the same | Thanh Cuong Nguyen, Daekeon Kim, Naoto Umezawa, Hyunwoo KIM | 2024-12-31 |
| 12112948 | Method of manufacturing integrated circuit device using a metal-containing photoresist composition | Chawon Koh, Soyeon Yoo, Sooyoung Choi, Kwangsub Yoon, Brian J. Cardineau +1 more | 2024-10-08 |
| 11599021 | Photoresist compositions and methods for fabricating semiconductor devices using the same | Chawon Koh, Brian J. Cardineau, Sangyoon Woo, Jason K. Stowers, Soo Young Choi | 2023-03-07 |
| 11327398 | Photoresist compositions and methods for fabricating semiconductor devices using the same | Chawon Koh, Brian J. Cardineau, Sangyoon Woo, Jason K. Stowers, Soo Young Choi | 2022-05-10 |
| 8921025 | Positive resist compositions and patterning process | Tatsushi Kaneko, Koji Hasegawa | 2014-12-30 |
| 8658346 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | Takeru Watanabe, Masashi Iio | 2014-02-25 |
| 8426105 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Masashi Iio, Kazuhiro Katayama, Jun Hatakeyama, Takeshi Kinsho | 2013-04-23 |
| 8420290 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | Koji Hasegawa, Masaki Ohashi, Takeshi Kinsho, Masayoshi Sagehashi | 2013-04-16 |
| 8367310 | Pattern forming process and resist-modifying composition | Takeru Watanabe, Masashi Iio, Jun Hatakeyama, Yoshio Kawai | 2013-02-05 |
| 8329384 | Resist-modifying composition and pattern forming process | Takeru Watanabe, Kazuhiro Katayama, Masashi Iio, Jun Hatakeyama, Takeshi Kinsho | 2012-12-11 |
| 8247166 | Double patterning process | Katsuya Takemura, Jun Hatakeyama, Masaki Ohashi, Takeshi Kinsho | 2012-08-21 |
| 8129099 | Double patterning process | Katsuya Takemura, Jun Hatakeyama, Kazuhiro Katayama, Toshinobu Ishihara | 2012-03-06 |
| 8062831 | Carboxyl-containing lactone compound, polymer, resist composition, and patterning process | Satoshi Shinachi, Koji Hasegawa, Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe | 2011-11-22 |
| 7985528 | Positive resist composition and patterning process | Takeshi Kinsho, Masaki Ohashi, Koji Hasegawa, Masashi Iio | 2011-07-26 |
| 7981589 | Fluorinated monomer, fluorinated polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Katsuhiro Kobayashi, Takeru Watanabe | 2011-07-19 |
| 7871752 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Takeshi Kinsho, Seiichiro Tachibana | 2011-01-18 |
| 7868199 | Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Masaki Ohashi, Takeru Watanabe | 2011-01-11 |
| 7833694 | Lactone-containing compound, polymer, resist composition, and patterning process | Koji Hasegawa, Satoshi Shinachi, Katsuhiro Kobayashi, Takeshi Kinsho | 2010-11-16 |
| RE41580 | Lactone-containing compounds, polymers, resist compositions, and patterning method | Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe | 2010-08-24 |
| 7727704 | Positive resist compositions and patterning process | Ryosuke Taniguchi, Tomohiro Kobayashi | 2010-06-01 |
| 7718342 | Polymers, resist compositions and patterning process | Kenji Funatsu, Tomohiro Kobayashi, Koji Hasegawa | 2010-05-18 |
| 7691561 | Positive resist compositions and patterning process | Ryosuke Taniguchi, Tomohiro Kobayashi | 2010-04-06 |
| 7638260 | Positive resist compositions and patterning process | Akihiro Seki, Shigeo Tanaka, Katsuya Takemura | 2009-12-29 |
| 7618764 | Positive resist compositions and patterning process | Shigeo Tanaka, Akihiro Seki, Katsuya Takemura | 2009-11-17 |