Issued Patents All Time
Showing 26–50 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7618765 | Positive resist composition and patterning process | Seiichiro Tachibana, Katsuhiro Kobayashi | 2009-11-17 |
| 7611821 | Positive resist compositions and patterning process | Takeshi Kinsho | 2009-11-03 |
| 7601479 | Polymer, resist composition and patterning process | Seiichiro Tachibana, Tomohiro Kobayashi | 2009-10-13 |
| 7598015 | Polymer, resist composition and patterning process | Seiichiro Tachibana, Takeru Watanabe | 2009-10-06 |
| 7541133 | Positive resist composition and patterning process | Seiichiro Tachibana, Katsuhiro Kobayashi | 2009-06-02 |
| 7211367 | Photo acid generator, chemical amplification resist material | Tomohiro Kobayashi, Satoshi Watanabe, Youichi Ohsawa, Katsuhiro Kobayashi | 2007-05-01 |
| 7157207 | Polymer, resist material and patterning processing | Kenji Funatsu, Shigehiro Nagura | 2007-01-02 |
| 7135270 | Resist polymer, resist composition and patterning process | Takeru Watanabe, Junji Tsuchiya, Kenji Funatsu, Koji Hasegawa | 2006-11-14 |
| 7090961 | Photo acid generator, chemical amplification resist material and pattern formation method | Tomohiro Kobayashi, Satoshi Watanabe, Youichi Ohsawa, Katsuhiro Kobayashi | 2006-08-15 |
| 6962767 | Acetal compound, polymer, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2005-11-08 |
| 6946233 | Polymer, resist material and patterning method | Takeshi Kinsho | 2005-09-20 |
| 6899990 | Epoxy compound having alicyclic structure, polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe | 2005-05-31 |
| 6844133 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho | 2005-01-18 |
| 6835525 | Polymer, resist composition and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Kenji Funatsu | 2004-12-28 |
| 6830866 | Resist composition and patterning process | Tomohiro Kobayashi, Satoshi Watanabe, Takeshi Kinsho, Shigehiro Nagura, Toshinobu Ishihara | 2004-12-14 |
| 6794111 | Polymers, resist compositions and patterning process, novel tetrahydrofuran compounds and their preparation | Takeshi Kinsho, Seiichiro Tachibana, Takeru Watanabe, Koji Hasegawa, Tomohiro Kobayashi | 2004-09-21 |
| 6784268 | Ether, polymer, resist composition and patterning process | Seiichiro Tachibana, Mutsuo Nakashima | 2004-08-31 |
| 6780563 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2004-08-24 |
| 6743566 | Cyclic acetal compound, polymer, resist composition and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa +1 more | 2004-06-01 |
| 6703183 | Polymer, resist composition and patterning process | Takeshi Kinsho, Koji Hasegawa, Satoshi Watanabe, Shigehiro Nagura | 2004-03-09 |
| 6677101 | Polymers, resist materials, and pattern formation method | Koji Hasegawa, Mutsuo Nakashima | 2004-01-13 |
| 6673518 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeshi Kinsho | 2004-01-06 |
| 6673517 | Polymer, resist composition and patterning process | Takeshi Kinsho | 2004-01-06 |
| 6673515 | Polymer, resist composition and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe +1 more | 2004-01-06 |
| 6670498 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-12-30 |