Issued Patents All Time
Showing 51–75 of 88 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6670094 | Polymer, resist composition and patterning process | Mutsuo Nakashima, Tomohiro Kobayashi | 2003-12-30 |
| 6667145 | Resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Tomohiro Kobayashi, Jun Hatakeyama | 2003-12-23 |
| 6660448 | Polymer, resist composition and patterning process | Seiichiro Tachibana, Mutsuo Nakashima, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe +1 more | 2003-12-09 |
| 6653044 | Chemical amplification type resist composition | Takanobu Takeda, Osamu Watanabe, Jun Watanabe, Jun Hatakeyama, Takeshi Kinsho | 2003-11-25 |
| 6624335 | Ether, polymer, resist composition and patterning process | Seiichiro Tachibana, Mutsuo Nakashima | 2003-09-23 |
| 6605408 | Resist composition and patterning process | Takeshi Kinsho, Shigehiro Nagura, Tomohiro Kobayashi, Satoshi Watanabe | 2003-08-12 |
| 6605678 | Polymer, resist composition and patterning process | Mutsuo Nakashima, Tomohiro Kobayashi | 2003-08-12 |
| 6596463 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-07-22 |
| 6586157 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-07-01 |
| 6566038 | Polymers, resist compositions and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe +1 more | 2003-05-20 |
| 6566037 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Jun Hatakeyama | 2003-05-20 |
| 6541179 | Resist compositions and patterning process | Jun Hatakeyama, Youichi Ohsawa, Jun Watanabe | 2003-04-01 |
| 6531627 | Ester compounds, polymers, resist compositions and patterning process | Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-03-11 |
| 6524765 | Polymer, resist composition and patterning process | Takeru Watanabe, Jun Hatakeyama, Takeshi Kinsho, Koji Hasegawa, Seiichiro Tachibana | 2003-02-25 |
| 6515150 | Cyclic acetal compound, polymer, resist composition and patterning process | Mutsuo Nakashima, Seiichiro Tachibana, Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa +1 more | 2003-02-04 |
| 6515149 | Acetal compound, polymer, resist composition and patterning response | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2003-02-04 |
| 6512067 | Polymer, resist composition and patterning process | Mutsuo Nakashima, Tomohiro Kobayashi | 2003-01-28 |
| 6509135 | Polymer, resist composition and patterning process | Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Jun Hatakeyama | 2003-01-21 |
| 6500971 | Ester compounds having alicyclic and oxirane structures and method for preparing the same | Takeru Watanabe, Takeshi Kinsho, Koji Hasegawa, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2002-12-31 |
| 6500961 | Lactone compounds having alicyclic structure and their manufacturing method | Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2002-12-31 |
| 6492090 | Polymers, resist compositions and patterning process | Seiichiro Tachibana, Mutsuo Nakashima, Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa +1 more | 2002-12-10 |
| 6472543 | Lactone compounds having alicyclic structure and their manufacturing method | Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Mutsuo Nakashima, Seiichiro Tachibana +1 more | 2002-10-29 |
| 6448420 | Acid-decomposable ester compound suitable for use in resist material | Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Mutsuo Nakashima, Jun Hatakeyama | 2002-09-10 |
| 6444396 | Ester compounds, polymers, resist composition and patterning process | Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Koji Hasegawa, Jun Hatakeyama | 2002-09-03 |
| 6420085 | Resist compositions and patterning process | Youichi Ohsawa, Jun Hatakeyama | 2002-07-16 |