TN

Tsunehiro Nishi

SC Shin-Etsu Chemical Co.: 81 patents #23 of 2,176Top 2%
Samsung: 5 patents #22,466 of 75,807Top 30%
IN Inpria: 3 patents #21 of 43Top 50%
TC Tokyo Ohka Kogyo Co.: 1 patents #437 of 684Top 65%
NT NTT: 1 patents #2,911 of 4,871Top 60%
II Inha-Industry Partnership Institute: 1 patents #75 of 351Top 25%
ED Eudyna Devices: 1 patents #37 of 80Top 50%
Overall (All Time): #18,732 of 4,157,543Top 1%
88
Patents All Time

Issued Patents All Time

Showing 76–88 of 88 patents

Patent #TitleCo-InventorsDate
6413695 Resist compositions and patterning process Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Mutsuo Nakashima, Jun Hatakeyama 2002-07-02
6403822 Ester compounds having alicyclic structure and method for preparing same Takeru Watanabe, Koji Hasegawa, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-06-11
6403823 Ester compounds having alicyclic structure and method for preparing same Koji Hasegawa, Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Seiichiro Tachibana +1 more 2002-06-11
6399274 Resist composition and patterning process Takeshi Kinsho, Koji Hasegawa, Takeru Watanabe, Jun Hatakeyama 2002-06-04
6312867 Ester compounds, polymers, resist compositions and patterning process Takeshi Kinsho, Hideshi Kurihara, Koji Hasegawa, Takeru Watanabe, Osamu Watanabe +3 more 2001-11-06
6284429 Ester compounds, polymers, resist compositions and patterning process Takeshi Kinsho, Hideshi Kurihara, Mutsuo Nakashima, Koji Hasegawa, Takeru Watanabe 2001-09-04
6280898 Lactone-containing compounds, polymers, resist compositions, and patterning method Koji Hasegawa, Takeshi Kinsho, Jun Hatakeyama, Osamu Watanabe 2001-08-28
6274286 Resist compositions Jun Hatakeyama, Takeshi Nagata, Shigehiro Nagura 2001-08-14
6147249 Ester compounds, polymers, resist composition and patterning process Takeru Watanabe, Takeshi Kinsho, Mutsuo Nakashima, Koji Hasegawa, Jun Hatakeyama 2000-11-14
6048661 Polymeric compounds, chemically amplified positive type resist materials and process for pattern formation Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara 2000-04-11
6030746 Di- and triphenyl monoterpene hydrocarbon derivatives, dissolution inhibitors, and chemically amplified positive resist compositions Takeshi Nagata, Satoshi Watanabe, Jun Hatakeyama, Shigehiro Nagura, Toshinobu Ishihara 2000-02-29
6027854 Polymers chemically amplified positive resist compositions, and patterning method Osamu Watanabe, Satoshi Watanabe, Shigehiro Nagura, Toshinobu Ishihara 2000-02-22
5856561 Bisphenol carboxylic acid tertiary ester derivatives and chemically amplified positive resist compositions Takesi Nagata, Satoshi Watanabe, Katsuya Takemura, Shigehiro Nagura, Akinobu Tanaka +1 more 1999-01-05