Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12195568 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Hiroyuki Urano, Osamu Watanabe, Katsuya Takemura | 2025-01-14 |
| 12197127 | Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Hiroyuki Urano, Osamu Watanabe, Katsuya Takemura | 2025-01-14 |
| 12085856 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Hiroyuki Urano, Osamu Watanabe, Katsuya Takemura | 2024-09-10 |
| 11892773 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Hiroyuki Urano, Katsuya Takemura | 2024-02-06 |
| 11768434 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | Katsuya Takemura, Hiroyuki Urano, Kazuya Honda | 2023-09-26 |
| 11572442 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Katsuya Takemura, Kazuya Honda, Yoshio Kawai | 2023-02-07 |
| 11333975 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Hiroyuki Urano, Katsuya Takemura, Kazuya Honda, Yoshio Kawai | 2022-05-17 |
| 11150556 | Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Katsuya Takemura, Hiroyuki Urano | 2021-10-19 |
| 10919918 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Hiroyuki Urano, Hiroki Takano, Katsuya Takemura, Kazuya Honda | 2021-02-16 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Koji Hasegawa, Kenji Funatsu | 2020-10-27 |
| 10457779 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masayoshi Sagehashi, Koji Hasegawa | 2019-10-29 |
| 10216085 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Hiroyuki Urano, Masayoshi Sagehashi, Koji Hasegawa | 2019-02-26 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Hiroyuki Urano, Katsuya Takemura, Koji Hasegawa, Kenji Funatsu | 2019-02-12 |
| 10197914 | Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate | Katsuya Takemura, Hiroyuki Urano, Takashi Miyazaki | 2019-02-05 |
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Hiroyuki Urano, Katsuya Takemura, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara | 2018-10-30 |
| 10087288 | Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus | Hiroyuki Urano, Katsuya Takemura, Takashi Miyazaki | 2018-10-02 |
| 9557645 | Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate | Katsuya Takemura, Hiroyuki Urano, Takashi Miyazaki | 2017-01-31 |
| 9400428 | Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate | Hiroyuki Urano, Katsuya Takemura, Takashi Miyazaki | 2016-07-26 |
| 9377689 | Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film | Katsuya Takemura, Hiroyuki Urano, Takayuki Fujiwara, Koji Hasegawa | 2016-06-28 |
| 9310681 | Negative resist composition and patterning process using same | Jun Hatakeyama, Hiroyuki Urano | 2016-04-12 |
| 9017928 | Methods for manufacturing resin structure and micro-structure | Yoshinori Hirano, Hideyoshi Yanagisawa | 2015-04-28 |
| 9017905 | Chemically amplified positive resist composition and pattern forming process | Katsuya Takemura, Takashi Miyazaki, Hideyoshi Yanagisawa | 2015-04-28 |
| 8951717 | Methods for manufacturing resin structure and micro-structure | Yoshinori Hirano, Hideyoshi Yanagisawa | 2015-02-10 |
| 8703404 | Patterning process | Jun Hatakeyama | 2014-04-22 |
| 8658346 | Pattern forming process, chemically amplified positive resist composition, and resist-modifying composition | Takeru Watanabe, Tsunehiro Nishi | 2014-02-25 |