Issued Patents All Time
Showing 1–25 of 27 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12195568 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Osamu Watanabe, Katsuya Takemura | 2025-01-14 |
| 12197127 | Negative photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Osamu Watanabe, Katsuya Takemura | 2025-01-14 |
| 12085856 | Positive photosensitive resin composition, positive photosensitive dry film, method for producing positive photosensitive dry film, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Osamu Watanabe, Katsuya Takemura | 2024-09-10 |
| 11892773 | Photosensitive resin composition, patterning process, method for forming cured film, interlayer insulation film, surface protective film, and electronic component | Masashi Iio, Katsuya Takemura | 2024-02-06 |
| 11768434 | Polymer having a structure of polyamide, polyamide-imide, or polyimide, photosensitive resin composition, patterning process, photosensitive dry film, and protective film for electric and electronic parts | Katsuya Takemura, Masashi Iio, Kazuya Honda | 2023-09-26 |
| 11572442 | Compound, polyimide resin and method of producing the same, photosensitive resin composition, patterning method and method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Katsuya Takemura, Masashi Iio, Kazuya Honda, Yoshio Kawai | 2023-02-07 |
| 11333975 | Polymer, photosensitive resin composition, patterning method, method of forming cured film, interlayer insulating film, surface protective film, and electronic component | Dmitry Zubarev, Katsuya Takemura, Masashi Iio, Kazuya Honda, Yoshio Kawai | 2022-05-17 |
| 11150556 | Polymer of polyimide precursor, positive type photosensitive resin composition, negative type photosensitive resin composition, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Katsuya Takemura, Masashi Iio | 2021-10-19 |
| 10919918 | Tetracarboxylic dianhydride, polyimide resin and method for producing the same, photosensitive resin compositions, patterning process, method for forming cured film, interlayer insulating film, surface protective film, and electronic parts | Hiroki Takano, Masashi Iio, Katsuya Takemura, Kazuya Honda | 2021-02-16 |
| 10816900 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Masashi Iio, Koji Hasegawa, Kenji Funatsu | 2020-10-27 |
| 10457779 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, positive photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa | 2019-10-29 |
| 10216085 | Tetracarboxylic acid diester compound, polyimide precursor polymer and method for producing the same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Masashi Iio, Masayoshi Sagehashi, Koji Hasegawa | 2019-02-26 |
| 10203601 | Tetracarboxylic acid diester compound, polymer of polyimide precursor and method for producing same, negative photosensitive resin composition, patterning process, and method for forming cured film | Katsuya Takemura, Masashi Iio, Koji Hasegawa, Kenji Funatsu | 2019-02-12 |
| 10197914 | Positive photosensitive resin composition, photo-curable dry film and method for producing the same, patterning process, and laminate | Katsuya Takemura, Masashi Iio, Takashi Miyazaki | 2019-02-05 |
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Masashi Iio, Katsuya Takemura, Koji Hasegawa, Masahiro Fukushima, Takayuki Fujiwara | 2018-10-30 |
| 10087288 | Silicone skeleton-containing polymer compound, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, substrate, and semiconductor apparatus | Masashi Iio, Katsuya Takemura, Takashi Miyazaki | 2018-10-02 |
| 9557645 | Positive photosensitive resin composition, photo-curable dry film and method for producing same, layered product, patterning process, and substrate | Katsuya Takemura, Masashi Iio, Takashi Miyazaki | 2017-01-31 |
| 9400428 | Polymer compound, chemically amplified negative resist composition, photo-curable dry film and production method thereof, layered product, patterning process, and substrate | Masashi Iio, Katsuya Takemura, Takashi Miyazaki | 2016-07-26 |
| 9377689 | Silicone structure-bearing polymer, negative resist composition, photo-curable dry film, patterning process, and electric/electronic part-protecting film | Katsuya Takemura, Masashi Iio, Takayuki Fujiwara, Koji Hasegawa | 2016-06-28 |
| 9366961 | Silicone structure-bearing polymer, resin composition, and photo-curable dry film | Katsuya Takemura, Takashi Miyazaki | 2016-06-14 |
| 9310681 | Negative resist composition and patterning process using same | Jun Hatakeyama, Masashi Iio | 2016-04-12 |
| 9091919 | Silicone structure-bearing polymer, resin composition, and photo-curable dry film | Katsuya Takemura, Takashi Miyazaki | 2015-07-28 |
| 8865391 | Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film | Katsuya Takemura, Takashi Miyazaki | 2014-10-21 |
| 8835697 | Biphenyl derivative, resist bottom layer material, bottom layer forming method, and patterning process | Daisuke KORI, Takeshi Kinsho, Katsuya Takemura, Tsutomu Ogihara, Takeru Watanabe | 2014-09-16 |
| 8439570 | Rolling bearing assembly and method of forming a lubrication device therefor | — | 2013-05-14 |