Issued Patents All Time
Showing 1–25 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12422751 | Positive resist composition and pattern forming process | Jun Hatakeyama | 2025-09-23 |
| 12275693 | Onium salt, chemically amplified resist composition and patterning process | Masayoshi Sagehashi, Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama | 2025-04-15 |
| 12276911 | Positive resist composition and pattern forming process | Jun Hatakeyama, Naoki Ishibashi | 2025-04-15 |
| 12231110 | Electronic component and method of manufacturing electronic component | Kazunori Inoue, Shintaro Otsuka, Koichiro Kawasaki, Hidefumi Nakanishi, Masakazu Atarashi +1 more | 2025-02-18 |
| 12216401 | Sulfonium salt, chemically amplified resist composition, and patterning process | Kazuhiro Katayama | 2025-02-04 |
| 12183645 | Electronic component including protective layer | Kazunori Inoue, Shintaro Otsuka, Koichiro Kawasaki, Hidefumi Nakanishi, Masakazu Atarashi | 2024-12-31 |
| 12060317 | Onium salt, chemically amplified negative resist composition, and pattern forming process | Satoshi Watanabe, Ryosuke Taniguchi, Naoya Inoue | 2024-08-13 |
| 12042261 | Imaging support apparatus, magnetic resonance imaging apparatus, and imaging support method | — | 2024-07-23 |
| 12032289 | Polymer, chemically amplified resist composition and patterning process | Masayoshi Sagehashi, Emiko Ono | 2024-07-09 |
| 11953827 | Molecular resist composition and patterning process | Masaki Ohashi, Kazuhiro Katayama | 2024-04-09 |
| 11940728 | Molecular resist composition and patterning process | Masaki Ohashi, Kazuhiro Katayama, Shun Kikuchi | 2024-03-26 |
| 11829067 | Resist composition and patterning process | Jun Hatakeyama | 2023-11-28 |
| 11815814 | Iodized aromatic carboxylic acid type pendant-containing polymer, resist composition and patterning process | Jun Hatakeyama | 2023-11-14 |
| 11782343 | Resist composition and patterning process | Jun Hatakeyama | 2023-10-10 |
| 11774853 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara, Kazuhiro Katayama | 2023-10-03 |
| 11773059 | Onium salt, chemically amplified negative resist composition, and pattern forming process | Naoya Inoue, Satoshi Watanabe, Ryosuke Taniguchi | 2023-10-03 |
| 11765978 | Acoustic wave device | Takashi Osawa | 2023-09-19 |
| 11762287 | Onium salt compound, chemically amplified resist composition and patterning process | Takayuki Fujiwara, Kenichi Oikawa, Tomohiro Kobayashi | 2023-09-19 |
| 11720021 | Positive resist composition and patterning process | Jun Hatakeyama | 2023-08-08 |
| 11709427 | Positive resist composition and pattern forming process | Jun Hatakeyama | 2023-07-25 |
| 11703760 | Fluorocarboxylic acid-containing monomer, fluorocarboxylic acid-containing polymer, resist composition and patterning process | Jun Hatakeyama | 2023-07-18 |
| 11687000 | Sulfonium compound, chemically amplified resist composition, and patterning process | Masaki Ohashi, Kazuhiro Katayama, Yuki Kera | 2023-06-27 |
| 11637232 | Acoustic wave device including Li2CO3 layer on piezoelectric substrate made of LiNbO3 or LiTaO3 | Takashi Osawa, Masaki TSUTSUMI | 2023-04-25 |
| 11560355 | Onium salt, chemically amplified resist composition, and patterning process | Masaki Ohashi, Kazuhiro Katayama | 2023-01-24 |
| 11460524 | Radio frequency coil | Satoshi Imai, Sadanori Tomiha, Misaki Kobayashi | 2022-10-04 |