Issued Patents All Time
Showing 26–50 of 66 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11435666 | Salt compound, chemically amplified resist composition, and patterning process | Emiko Ono, Masayoshi Sagehashi, Yuki Kera | 2022-09-06 |
| 11333974 | Onium salt, chemically amplified resist composition, and patterning process | — | 2022-05-17 |
| 11286320 | Polymerizable monomer, polymer compound for conductive polymer, and method for producing the polymer compound | Jun Hatakeyama, Takayuki Nagasawa, Koji Hasegawa, Masayoshi Sagehashi | 2022-03-29 |
| 11067652 | Radio frequency coil | — | 2021-07-20 |
| 11061090 | Magnetic resonance imaging apparatus and RF coil | Sadanori Tomiha, Manabu Ishii, Satoshi Imai | 2021-07-13 |
| 11009793 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama | 2021-05-18 |
| 10984241 | Medical image diagnosis apparatus and magnetic resonance imaging apparatus | Miyuki Ota, Mitsuo Takagi, Sadanori Tomiha, Satoshi Imai, Manabu Ishii +1 more | 2021-04-20 |
| 10958240 | Elastic wave device | Seiji Kai, Takuya Koyanagi | 2021-03-23 |
| 10948822 | Resist composition and patterning process | Jun Hatakeyama, Koji Hasegawa | 2021-03-16 |
| 10915021 | Monomer, polymer, resist composition, and patterning process | Koji Hasegawa, Jun Hatakeyama | 2021-02-09 |
| 10871711 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara | 2020-12-22 |
| 10845439 | Magnetic resonance imaging apparatus using positional information based on an image obtained by reconstructing a magnetic resonance signal | Shinji Mitsui, Satoshi Imai, Miyuki Ota, Sadanori Tomiha | 2020-11-24 |
| 10591819 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-03-17 |
| 10527939 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2020-01-07 |
| 10323113 | Resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi, Takayuki Fujiwara, Kazuya Honda | 2019-06-18 |
| 10320362 | Elastic wave device | Taku Kikuchi, Shin Saijo, Hisashi Yamazaki, Yuji Miwa | 2019-06-11 |
| 10205435 | Surface acoustic wave device | Taku Kikuchi | 2019-02-12 |
| 10120278 | Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming process | Kazuhiro Katayama | 2018-11-06 |
| 10114287 | Silicone skeleton-containing polymer compound and method for producing same, chemically amplified negative resist composition, photo-curable dry film and method for producing same, patterning process, layered product, and substrate | Hiroyuki Urano, Masashi Iio, Katsuya Takemura, Koji Hasegawa, Takayuki Fujiwara | 2018-10-30 |
| 10023674 | Monomer, polymer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama, Jun Hatakeyama | 2018-07-17 |
| 10007178 | Positive resist composition and patterning process | Jun Hatakeyama, Masaki Ohashi | 2018-06-26 |
| 9989847 | Onium salt compound, resist composition, and pattern forming process | Masaki Ohashi, Jun Hatakeyama | 2018-06-05 |
| 9897916 | Compound, polymer compound, resist composition, and patterning process | Masaki Ohashi, Jun Hatakeyama, Takayuki Fujiwara | 2018-02-20 |
| 9790166 | Polymer, monomer, resist composition, and patterning process | Masayoshi Sagehashi, Koji Hasegawa, Jun Hatakeyama, Kazuhiro Katayama | 2017-10-17 |
| 9740100 | Hemiacetal compound, polymer, resist composition, and patterning process | Koji Hasegawa, Masayoshi Sagehashi, Ryosuke Taniguchi | 2017-08-22 |